Resonant gratings with an etch-stop layer and a fabrication-error tolerant design

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dc.contributor.authorHogan, Brian
dc.contributor.authorLewis, Liam
dc.contributor.authorRomero-Vivas, Javier
dc.contributor.authorOchalski, Tomasz J.
dc.contributor.authorHegarty, Stephen P.
dc.contributor.funderScience Foundation Ireland
dc.date.accessioned2018-09-24T12:36:56Z
dc.date.available2018-09-24T12:36:56Z
dc.date.issued2018
dc.description.abstractSub-wavelength gratings (SWG) have shown much promise for applications such as lightweight high bandwidth reflectors, polarising filters and focusing lenses. Unfortunately, grating performance may be rapidly degraded through variability in grating dimensions. We demonstrate, in particular, how an error in depth of etch can be detrimental to the performance of zero contrast grating reflectors. We mitigate the impact of this fabrication error through the introduction of an etch stop layer and in so doing we experimentally realise a high bandwidth reflector based on this modified structure. Another common fabrication error is variation in the duty-cycle of fabricated gratings. This duty-cycle variation can weaken grating performance, however we demonstrate that grating designs that exhibit tolerance to duty-cycle fluctuation can be identified through simulation. Finally, we discuss the impact of lateral etching and the resulting sidewall concavity. We present our approach for numerically predicting the spectral response from such a grating and also for convenience we outline an approach for quickly approximating grating performance. Good agreement is observed between these numerical predictions and measurements made on a HCG with concave sidewalls. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreementen
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationHogan, B., Lewis, L., Romero-Vivas, J., Ochalski, T. J. and Hegarty, S. P. (2018) 'Resonant gratings with an etch-stop layer and a fabrication-error tolerant design', Optics Express, 26(10), pp. 13205-13213. doi: 10.1364/OE.26.013205en
dc.identifier.doi10.1364/OE.26.013205
dc.identifier.endpage13213
dc.identifier.issn1094-4087
dc.identifier.issued10
dc.identifier.journaltitleOptics Expressen
dc.identifier.startpage13205
dc.identifier.urihttps://hdl.handle.net/10468/6870
dc.identifier.volume26
dc.language.isoenen
dc.publisherOptical Society of Americaen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Industry Fellowship/15/IFB/3626/IE/Innovative protocol for the development of nanoporous/nanostructured materials patterning using block copolymer lithography for advanced optoelectronic thermal management/
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/
dc.relation.urihttps://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-10-13205
dc.rights© 2018, Optical Society of America under the terms of the OSA Open Access Publishing Agreementen
dc.subjectHigh-contrast gratingsen
dc.subjectCoupled-wave A nalysisen
dc.subjectReflectorsen
dc.subjectImplementationen
dc.subjectFiltersen
dc.titleResonant gratings with an etch-stop layer and a fabrication-error tolerant designen
dc.typeArticle (peer-reviewed)en
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