Ultra-high-density arrays of defect-free AlN nanorods: a "space-filling" approach
dc.contributor.author | Conroy, Michele | |
dc.contributor.author | Zubialevich, Vitaly Z. | |
dc.contributor.author | Li, Haoning | |
dc.contributor.author | Petkov, Nikolay | |
dc.contributor.author | O'Donoghue, Sally | |
dc.contributor.author | Holmes, Justin D. | |
dc.contributor.author | Parbrook, Peter J. | |
dc.contributor.funder | Higher Education Authority | en |
dc.contributor.funder | Science Foundation Ireland | en |
dc.date.accessioned | 2018-01-26T15:17:44Z | |
dc.date.available | 2018-01-26T15:17:44Z | |
dc.date.issued | 2015-11-24 | |
dc.date.updated | 2018-01-26T14:59:03Z | |
dc.description.abstract | Nanostructured semiconductors have a clear potential for improved optoelectronic devices, such as high-efficiency light-emitting diodes (LEDs). However, most arrays of semiconductor nanorods suffer from having relatively low densities (or “fill factors”) and a high degree of nonuniformity, especially when produced by self-organized growth. Ideally an array of nanorods for an optoelectronic emitter should have a fill factor close to 100%, with uniform rod diameter and height. In this article we present a “space-filling” approach for forming defect-free arrays of AlN nanorods, whereby the separation between each rod can be controlled to 5 nm due to a self-limiting process. These arrays of pyramidal-topped AlN nanorods formed over wafer-scale areas by metal organic chemical vapor deposition provide a defect-free semipolar top surface, for potential optoelectronic device applications with the highest reported fill factor at 98%. | en |
dc.description.sponsorship | Higher Education Authority ((Programme for Research in Third Level Institutions Cycles 4 and 5 via the INSPIRE and TYFFANI projects), (Irish Government’s Programme for Research in Third Level Institutions Cycle 5, National Development Plan 2007−2013, with the assistance of the European Regional Development Fund)) | en |
dc.description.status | Peer reviewed | en |
dc.description.version | Accepted Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Conroy, M., Zubialevich, V. Z., Li, H., Petkov, N., O’Donoghue, S., Holmes, J. D. and Parbrook, P. J. (2016) 'Ultra-High-Density Arrays of Defect-Free AlN Nanorods: A “Space-Filling” Approach', ACS Nano, 10(2), pp. 1988-1994. doi:10.1021/acsnano.5b06062 | en |
dc.identifier.doi | 10.1021/acsnano.5b06062 | |
dc.identifier.endpage | 1994 | en |
dc.identifier.issn | 1936-0851 | |
dc.identifier.issued | 2 | en |
dc.identifier.journaltitle | ACS Nano | en |
dc.identifier.startpage | 1988 | en |
dc.identifier.uri | https://hdl.handle.net/10468/5334 | |
dc.identifier.volume | 10 | en |
dc.language.iso | en | en |
dc.publisher | American Chemical Society | en |
dc.relation.project | info:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/10/IN.1/I2993/IE/Advanced Ultraviolet Emitters from InAlN Based Alloy Structures/ | en |
dc.relation.project | info:eu-repo/grantAgreement/SFI/SFI Stokes Professorship & Lectureship Programme/07/EN/E001A/IE/Peter Parbrook/ | en |
dc.rights | © 2015 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://pubs.acs.org/doi/abs/10.1021/acsnano.5b06062 | en |
dc.subject | Aluminum nitride | en |
dc.subject | Growth mechanism | en |
dc.subject | III-nitrides | en |
dc.subject | Nanorods | en |
dc.subject | Nanowires | en |
dc.title | Ultra-high-density arrays of defect-free AlN nanorods: a "space-filling" approach | en |
dc.type | Article (peer-reviewed) | en |
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