Bismuth self-limiting growth of ultrathin BiFeO3 films

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dc.contributor.authorDeepak, Nitin
dc.contributor.authorCarolan, Patrick B.
dc.contributor.authorKeeney, Lynette
dc.contributor.authorZhang, Panfeng F.
dc.contributor.authorPemble, Martyn E.
dc.contributor.authorWhatmore, Roger W.
dc.contributor.funderIrish Research Council for Science, Engineering and Technologyen
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderHigher Education Authorityen
dc.date.accessioned2019-04-08T11:00:47Z
dc.date.available2019-04-08T11:00:47Z
dc.date.issued2015-09-11
dc.date.updated2019-03-26T09:11:08Z
dc.description.abstractBismuth ferrite (BiFeO3) is a widely studied material, because of its interesting multiferroic properties. Bismuth self-limiting growth of single-phase BiFeO3 (BFO) has previously been achieved using molecular beam epitaxy (MBE), but the growth of BFO by chemical vapor deposition (CVD) has proved to be very challenging, because of the volatile nature of bismuth. The growth window regarding temperature, pressure, and precursor flow rates that will give a pure perovskite BFO phase is normally very small. In this work, we have studied the metal–organic CVD (MOCVD) growth of epitaxial BFO thin films on SrTiO3 substrates and found that by carefully controlling the amount of the iron precursor, Fe(thd)3 (where thd = 2,2,6,6 tetra-methyl-3,5-heptanedionate), we were able to achieve bismuth self-liming growth, for the first time. The effect of the volume of the bismuth and iron precursors injected on the growth of BFO thin films is reported, and it has been found that the phase-pure films can be prepared when the Bi/Fe ratios are between 1.33 and 1.81 under temperature and pressure conditions of 650 °C and 10 mbar, respectively, and where the O2 gas flow was kept constant to 1000 sccm out of a total gas flow of 3000 sccm. Piezoresponse force microscopy (PFM) studies demonstrate the presence of bipolar switching in ultrathin BFO films.en
dc.description.sponsorshipIrish Research Council for Science, Engineering and Technology (International Centre for Graduate Education in micro-& nano-Engineering, ICGEE); Higher Education Authority (HEA Program for Research in Third Level Institutions (2007−2011) via the INSPIRE program)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationDeepak, N., Carolan, P., Keeney, L., Zhang, P. F., Pemble, M. E. and Whatmore, R. W. (2015) 'Bismuth Self-Limiting Growth of Ultrathin BiFeO3 Films', Chemistry of Materials, 27(19), pp. 6508-6515. doi: 10.1021/acs.chemmater.5b03034en
dc.identifier.doi10.1021/acs.chemmater.5b03034en
dc.identifier.eissn1520-5002
dc.identifier.endpage6515en
dc.identifier.issn0897-4756
dc.identifier.journaltitleChemistry Materialsen
dc.identifier.startpage6508en
dc.identifier.urihttps://hdl.handle.net/10468/7724
dc.identifier.volume27en
dc.language.isoenen
dc.publisherAmerican Chemical Society, ACSen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Strategic Research Cluster/07/SRC/I1172/IE/SRC FORME: Functional Oxides and Related Materials for Electronics/en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/11/PI/1117/IE/New Materials and Devices for Optical Applications via the use of Hybrid Technologies: Colloidal Crystallisation and Advanced Thin Film Deposition/en
dc.relation.urihttps://pubs.acs.org/doi/10.1021/acs.chemmater.5b03034
dc.rights© 2015 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials after peer review and technical editing by the publisher. To access the final edited and published work see https://dx.doi.org/10.1021/acs.chemmater.5b03034en
dc.subjectBismuth ferriteen
dc.subjectBiFeO3en
dc.subjectChemical vapor depositionen
dc.subjectMultiferroic tunnel junctionsen
dc.subjectMolecular beam methoden
dc.subjectThickness dependenceen
dc.subjectThin filmsen
dc.subjectEpitaxyen
dc.subjectGaASen
dc.subjectPropertyen
dc.subjectPbTiO3en
dc.subjectMemoryen
dc.titleBismuth self-limiting growth of ultrathin BiFeO3 filmsen
dc.typeArticle (peer-reviewed)en
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