Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications

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dc.contributor.authorKulkarni, Santosh
dc.contributor.authorRoy, Saibal
dc.contributor.funderSixth Framework Programme
dc.date.accessioned2017-07-12T09:07:45Z
dc.date.available2017-07-12T09:07:45Z
dc.date.issued2007-05-08
dc.description.abstractCo-rich CoPtP alloys have been electrodeposited using direct current (dc) and pulse-reverse (PR) plating techniques. The surface morphology, crystalline structure, grain size, and magnetic properties of the plated films have been compared. The x-ray analysis and magnetic measurements reveal the presence of Co hcp hard magnetic phase with c axis perpendicular to the substrate for dc and in plane for PR plated films. The dc plated films have a granular structure in the micron scale with large cracks, which are manifestation of stress in the film. Only by using a combination of optimized PR plating conditions and stress relieving additive, we are able to produce 1-6 mu m thick (for 1 hour of plating), stress-free, and nanostructured (similar to 20 nm) Co-rich CoPtP single hcp phase at room temperature, with an intrinsic coercivity of 1500 Oe.en
dc.description.sponsorshipEuropean Commission (European Union Framework 6 STREP project VIBES (507911))en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid09K524
dc.identifier.citationKulkarni, S. and Roy, S. (2007) 'Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications', Journal of Applied Physics, 101(9), pp. 09K524. doi: 10.1063/1.2712032en
dc.identifier.doi10.1063/1.2712032
dc.identifier.endpage3
dc.identifier.issn0021-8979
dc.identifier.issued9
dc.identifier.journaltitleJournal of Applied Physicsen
dc.identifier.startpage1
dc.identifier.urihttps://hdl.handle.net/10468/4228
dc.identifier.volume101
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.ispartof10th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference
dc.relation.urihttp://aip.scitation.org/doi/abs/10.1063/1.2712032
dc.rights© 2007 American Institute of Physics, This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Kulkarni, S. and Roy, S. (2007) 'Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications', Journal of Applied Physics, 101(9), pp. 09K524 and may be found at http://aip.scitation.org/doi/abs/10.1063/1.2712032en
dc.subjectPt thin-filmsen
dc.subjectAnisotropyen
dc.subjectElectrodepositionen
dc.subjectCoercive forceen
dc.subjectMagnetic filmsen
dc.subjectSputter depositionen
dc.subjectMicroelectromechanical systemsen
dc.titleDevelopment of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applicationsen
dc.typeArticle (peer-reviewed)en
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