In-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surface

dc.contributor.authorO'Dwyer, Colm
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderEuropean Commissionen
dc.date.accessioned2016-07-06T15:36:26Z
dc.date.available2016-07-06T15:36:26Z
dc.date.issued2006-12-29
dc.date.updated2012-11-29T18:14:41Z
dc.description.abstractAn examination of the selective etching mechanism of a 1-alkanethiol self-assembled monolayer (SAM) covered Au{111} surface using in-situ atomic force microscopy (AFM) and molecular resolution scanning tunnelling microscopy (STM) is presented. The monolayer self-assembles on a smooth Au{111} surface and typically contains nanoscale non-uniformities such as pinholes, domain boundaries and monatomic depressions. During etching in a ferri/ferrocyanide water-based etchant, selective and preferential etching occurs at SAM covered Au(111) terrace and step edges where a lower SAM packing density is observed, resulting in triangular islands being relieved. The triangular islands are commensurate with the Au(111) lattice with their long edges parallel to its [11-0] direction. Thus, SAM etching is selective and preferential attack is localized to defects and step edges at sites of high molecular density contrast.en
dc.description.sponsorshipEuropean Commission (Human Potential Programme under contract HPRN-CT-2002-00304);en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationO'Dwyer, C. (2007) 'In-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surface'. Materials Letters, 61(18), pp. 3837-3841. doi: 1016/j.matlet.2006.12.043en
dc.identifier.doi1016/j.matlet.2006.12.043
dc.identifier.endpage3841en
dc.identifier.issn0167-577X
dc.identifier.issn1873-4979
dc.identifier.issued18en
dc.identifier.journaltitleMaterials Lettersen
dc.identifier.startpage3837en
dc.identifier.urihttps://hdl.handle.net/10468/2832
dc.identifier.volume61en
dc.language.isoenen
dc.publisherElsevieren
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/02/IN.1/I172/IE/Silicon-Based Photonic Circuits Containing 2- and 3-Dimensional Photonic Crystal Waveguides and Light Sources for Communication Applications in the Visible and Near-Infrared Spectral Range/
dc.relation.urihttp://www.sciencedirect.com/science/article/pii/S0167577X06015266
dc.rights© 2006 Elsevier B.V. This manuscript version is made available under the CC-BY-NC-ND 4.0 licenseen
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/en
dc.subjectAtomic force microscopyen
dc.subjectCrystal latticesen
dc.subjectDomain wallsen
dc.subjectElectrochemical etchingen
dc.subjectMolecular interactionsen
dc.subjectSelf assembled monolayersen
dc.titleIn-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surfaceen
dc.typeArticle (peer-reviewed)en
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