Development of block copolymer lithography for device structure fabrication

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dc.check.embargoformatNot applicableen
dc.check.infoNo embargo requireden
dc.check.opt-outNot applicableen
dc.check.reasonNo embargo requireden
dc.check.typeNo Embargo Required
dc.contributor.advisorMorris, Michael A.en
dc.contributor.authorSenthamaraikannan, Ramsankar
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2015-12-09T09:07:45Z
dc.date.available2015-12-09T09:07:45Z
dc.date.issued2014
dc.date.submitted2014
dc.description.abstractThis thesis investigated well-ordered block copolymer (BCP) thin film characteristics and their use for nanoscale pattern formation using a series of polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-blockpolydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(ethylene oxide) (PS-b-PEO) systems of various molecular weights. BCP thin films, which act as an ‘on-chip’ etch mask and material templates, are highly promising self-assembling process for future scalable nanolithography. Unlike conventional BCP processing methods, the work in this thesis demonstrates that well-ordered patterns can be achieved in a few seconds compared to several hours by use of a non-conventional microwave assisted technique. As a result, well-ordered BCP nanoscale structures can be developed in industry appropriate periods facilitating their incorporation into current technologies. An optimised and controlled plasma dry etch process was used for successful pattern transfer to the underlying silicon substrate. Long range ordered BCP templates were further modified by selective metal inclusion technique to form a hard mask template towards fabrication of high aspect ratio nanopillars and nanowires. The work described here is centred on how these templates might be used to generate function at substrate surfaces. Herein we describe a number of innovations which might allow their successful uptake in a number of applications.en
dc.description.statusNot peer revieweden
dc.description.versionAccepted Version
dc.format.mimetypeapplication/pdfen
dc.identifier.citationSenthamaraikannan, R. 2014. Development of block copolymer lithography for device structure fabrication. PhD Thesis, University College Cork.en
dc.identifier.endpage142
dc.identifier.urihttps://hdl.handle.net/10468/2130
dc.language.isoenen
dc.publisherUniversity College Corken
dc.rights© 2014, Ramsankar Senthamaraikannan.en
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/en
dc.subjectSelf-assemblyen
dc.subjectPS-b-PMMAen
dc.subjectPS-b-PDMSen
dc.subjectPS-b-PEOen
dc.subjectBCPen
dc.subjectBlock copolymeren
dc.subjectNanolithographyen
dc.subjectMicrowaveen
dc.subjectPlasma dry etchen
dc.subjectHard masken
dc.subjectMoore's lawen
dc.thesis.opt-outfalse
dc.titleDevelopment of block copolymer lithography for device structure fabricationen
dc.typeDoctoral thesisen
dc.type.qualificationlevelDoctoralen
dc.type.qualificationnamePhD (Science)en
ucc.workflow.supervisorm.morris@ucc.ie
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