Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: design and characterization

dc.contributor.authorCarroll, Lee
dc.contributor.funderEuropean Commissionen
dc.contributor.funderSeventh Framework Programmeen
dc.date.accessioned2017-02-16T16:02:49Z
dc.date.available2017-02-16T16:02:49Z
dc.date.issued2017-02-11
dc.description.abstractOptical resonators are fundamental building-blocks for the development of Si-photonics-integrated circuits, as tunable on-chip optical filters. In addition to the specific spectral shape, which may vary according to a particular application, extremely low losses from these devices are a crucial requirement. In the current state-of-the-art devices, most low-loss filters have only been demonstrated by exploiting ad hoc lithographic and etching techniques, which are not compatible with the standard CMOS (complementary metal-oxide semiconductor) process-flow available at Si-photonic foundries. In this paper, we describe the design and optimization of optical micro-resonators, based on Si-waveguides with a height lower than the standard ones (i.e., less than 220 nm), prepared on SOI (silicon on insulator) platform, which allow the realization of high-performance optical filters with an insertion loss lower than 1 dB, using only previously validated lithographic etch-depths.en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationMarchetti, R., Vitali, V., Lacava, C., Cristiani, I., Giuliani, G., Muffato, V., Fournier, M., Abrate, S., Gaudino, R., Temporiti, E., Carroll, L. and Minzioni, P. (2017) 'Low-Loss Micro-Resonator Filters Fabricated in Silicon by CMOS-Compatible Lithographic Techniques: Design and Characterization', Applied Sciences, 7(2), pp. 174. doi:10.3390/app7020174en
dc.identifier.doi10.3390/app7020174
dc.identifier.endpage174-11en
dc.identifier.issn2076-3417
dc.identifier.issued2en
dc.identifier.journaltitleApplied Sciencesen
dc.identifier.startpage174-1en
dc.identifier.urihttps://hdl.handle.net/10468/3648
dc.identifier.volume7en
dc.language.isoenen
dc.publisherMDPIen
dc.relation.projectinfo:eu-repo/grantAgreement/EC/FP7::SP1::ICT/318704/EU/FDMA Access By Using Low-cost Optical Network Units in Silicon Photonics/FABULOUSen
dc.rights© 2017 by the authors; licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).en
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en
dc.subjectSilicon photonicsen
dc.subjectMicro-ringsen
dc.subjectIntegrated filtersen
dc.subjectOptical lossesen
dc.subjectOptical componentsen
dc.subjectIntegrated waveguidesen
dc.titleLow-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: design and characterizationen
dc.typeArticle (peer-reviewed)en
Files
Original bundle
Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
2540.pdf
Size:
2.27 MB
Format:
Adobe Portable Document Format
Description:
Published Version
License bundle
Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
2.71 KB
Format:
Item-specific license agreed upon to submission
Description: