Pore directionality and correlation lengths of mesoporous silica channels aligned by physical epitaxy

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dc.contributor.authorBolger, Ciara T.
dc.contributor.authorFarrell, Richard A.
dc.contributor.authorHughes, Gareth M.
dc.contributor.authorMorris, Michael A.
dc.contributor.authorPetkov, Nikolay
dc.contributor.authorHolmes, Justin D.
dc.contributor.funderIrish Research Council for Science, Engineering and Technologyen
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderHigher Education Authorityen
dc.date.accessioned2019-07-12T14:02:47Z
dc.date.available2019-07-12T14:02:47Z
dc.date.issued2009-07-13
dc.date.updated2019-06-28T15:48:37Z
dc.description.abstractHerein we report on the alignment of mesoporous silica, a potential host for sub-10 nm nanostructures, by controlling its deposition within patterned substrates. In-depth characterization of the correlation lengths (length of a linear porous channel), defects of the porous network (delamination), and how the silica mesopores register to the micrometer-sized substrate pattern was achieved by means of novel focused ion beam (FIB) sectioning and in situ SEM imaging, which to our knowledge has not previously been reported for such a system. Our findings establish that, under confinement, directed deposition of the sol within channeled substrates, where the cross-sectional aspect ratio of the channels approaches unity, induces alignment of the mesopores along the length of the channels. The pore correlation length was found to extend beyond the micrometer scale, with high pore uniformity from channel to channel observed with infrequent delamination defects. Such information on pore correlation lengths and defect densities is critical for subsequent nanowire growth within the mesoporous channels, contact layout (electrode deposition etc.), and possible device architectures.en
dc.description.sponsorshipHigher Education Authority (Higher Education Authority Program for Research in Third Level Institutions (2007-2011) via the INSPIRE programme)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationBolger, C. T., Farrell, R. A., Hughes, G. M., Morris, M. A., Petkov, N. and Holmes, J. D. (2009) 'Pore Directionality and Correlation Lengths of Mesoporous Silica Channels Aligned by Physical Epitaxy', ACS Nano, 3(8), pp. 2311-2319. doi: 10.1021/nn900408qen
dc.identifier.doi10.1021/nn900408qen
dc.identifier.endpage2319en
dc.identifier.issn1936-0851
dc.identifier.issued8en
dc.identifier.journaltitleACS Nanoen
dc.identifier.startpage2311en
dc.identifier.urihttps://hdl.handle.net/10468/8157
dc.identifier.volume3en
dc.language.isoenen
dc.publisherAmerican Chemical Society, ACSen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/03/IN.3/I375/IE/The assembly of electronically important materials as structurally and size controlled nanowires into 3-dimensional architectures and construction of Prototype circuitry there from./en
dc.relation.urihttps://pubs.acs.org/doi/abs/10.1021/nn900408q
dc.rights© 2009 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/nn900408qen
dc.subjectPore directionalityen
dc.subjectPhysical epitaxyen
dc.subjectMesoporous silicaen
dc.subjectDirected self-assemblyen
dc.subjectCorrelation lengthen
dc.subjectin situ SEM imagingen
dc.titlePore directionality and correlation lengths of mesoporous silica channels aligned by physical epitaxyen
dc.typeArticle (peer-reviewed)en
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