Enhancement of the electronic thermoelectric properties of bulk strained silicon-germanium alloys using the scattering relaxation times from first principles calculations

dc.check.date2020-12-02
dc.check.infoAccess to this article is restricted until 12 months after publication by request of the publisher.en
dc.contributor.authorMurphy-Armando, Felipe
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2019-12-20T09:58:52Z
dc.date.available2019-12-20T09:58:52Z
dc.date.issued2019-12-02
dc.description.abstractWe use first-principles electronic structure methods to calculate the electronic thermoelectric properties (i.e., due to electronic transport only) of single-crystalline bulk n-type silicon-germanium alloys vs Ge composition, temperature, doping concentration, and strain. We find excellent agreement to available experiments for the resistivity, mobility, and Seebeck coefficient. These results are combined with the experimental lattice thermal conductivity to calculate the thermoelectric figure of merit ZT, finding very good agreement with experiments. We predict that 3% tensile hydrostatic strain enhances the n-type ZT by 50% at carrier concentrations of n=1020cm−3 and a temperature of T=1200K. These enhancements occur at different alloy compositions due to different effects: at 50% Ge composition, the enhancements are achieved by a strain induced decrease in the Lorenz number, while the power factor remains unchanged. These characteristics are important for highly doped and high temperature materials, in which up to 50% of the heat is carried by electrons. At 70% Ge, the increase in ZT is due to a large increase in the electrical conductivity produced by populating the high mobility Γ conduction band valley, lowered in energy by strain.en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid215103en
dc.identifier.citationMurphy-Armando, F. (2019) ‘Enhancement of the electronic thermoelectric properties of bulk strained silicon-germanium alloys using the scattering relaxation times from first principles calculations’, Journal of Applied Physics, 126, 215103 (9pp). doi: 10.1063/1.5117345en
dc.identifier.doi10.1063/1.5117345en
dc.identifier.eissn1089-7550
dc.identifier.endpage9en
dc.identifier.issn0021-8979
dc.identifier.journaltitleJournal of Applied Physicsen
dc.identifier.startpage1en
dc.identifier.urihttps://hdl.handle.net/10468/9439
dc.identifier.volume126en
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Investigator Programme/12/IA/1601/IE/Ultrafast energy dissipation in semimetals and semiconductors: Simulation based on first-principles electronic structure theory/en
dc.rights© 2019, the Author. Published under license by AIP Publishing. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared as: Murphy-Armando, F. (2019) ‘Enhancement of the electronic thermoelectric properties of bulk strained silicon-germanium alloys using the scattering relaxation times from first principles calculations’, Journal of Applied Physics, 126, 215103 (9pp), doi: 10.1063/1.5117345, and may be found at https://doi.org/10.1063/1.5117345en
dc.subjectElectronic thermoelectric propertiesen
dc.subjectSingle-crystalline bulk n-type silicon-germanium alloysen
dc.subjectGe compositionen
dc.subjectTemperatureen
dc.subjectDoping concentrationen
dc.subjectStrainen
dc.subjectResistivityen
dc.subjectMobilityen
dc.subjectSeebeck coefficienten
dc.titleEnhancement of the electronic thermoelectric properties of bulk strained silicon-germanium alloys using the scattering relaxation times from first principles calculationsen
dc.typeArticle (peer-reviewed)en
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