Atomic vapor deposition of bismuth titanate thin films
dc.contributor.author | Deepak, Nitin | |
dc.contributor.author | Zhang, Panfeng F. | |
dc.contributor.author | Keeney, Lynette | |
dc.contributor.author | Pemble, Martyn E. | |
dc.contributor.author | Whatmore, Roger W. | |
dc.contributor.funder | Higher Education Authority | en |
dc.contributor.funder | Science Foundation Ireland | en |
dc.contributor.funder | International Centre for Graduate Education in Micro and Nano Engineering (ICGEE) | en |
dc.date.accessioned | 2016-07-22T14:40:29Z | |
dc.date.available | 2016-07-22T14:40:29Z | |
dc.date.issued | 2013-05-08 | |
dc.date.updated | 2014-09-03T10:29:09Z | |
dc.description.abstract | c-axis oriented ferroelectric bismuth titanate (Bi4Ti 3O12) thin films were grown on (001) strontium titanate (SrTiO3) substrates by an atomic vapor deposition technique. The ferroelectric properties of the thin films are greatly affected by the presence of various kinds of defects. Detailed x-ray diffraction data and transmission electron microscopy analysis demonstrated the presence of out-of-phase boundaries (OPBs). It is found that the OPB density changes appreciably with the amount of titanium injected during growth of the thin films. Piezo-responses of the thin films were measured by piezo-force microscopy. It is found that the in-plane piezoresponse is stronger than the out-of-plane response, due to the strong c-axis orientation of the films. | en |
dc.description.sponsorship | International Centre for Graduate Education in micro and nano Engineering (ICGEE), (Ph.D funding); Science Foundation Ireland (SFI FORME Strategic Research Cluster Award No. 07/SRC/I1172); Higher Education Authority (Program for Research in Third Level Institutions (2007-2011) via the INSPIRE program.) | en |
dc.description.status | Peer reviewed | en |
dc.description.version | Published Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.articleid | 187207 | |
dc.identifier.citation | Deepak, N., Zhang, P. F., Keeney, L., Pemble, M. E. and Whatmore, R. W. (2013) 'Atomic vapor deposition of bismuth titanate thin films'. Journal of Applied Physics, 113, 187207. http://scitation.aip.org/content/aip/journal/jap/113/18/10.1063/1.4801985 | en |
dc.identifier.doi | 10.1063/1.4801985 | |
dc.identifier.endpage | 187207-7 | en |
dc.identifier.issn | 0021-8979 | |
dc.identifier.issn | 1089-7550 | |
dc.identifier.journaltitle | Journal of Applied Physics | en |
dc.identifier.startpage | 187207-1 | en |
dc.identifier.uri | https://hdl.handle.net/10468/2931 | |
dc.identifier.volume | 113 | en |
dc.language.iso | en | en |
dc.publisher | AIP Publishing | en |
dc.rights | © 2013 AIP Publishing LLC. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in J. Appl. Phys. 113, 187207 (2013) and may be found at http://scitation.aip.org/content/aip/journal/jap/113/18/10.1063/1.4801985 | en |
dc.subject | Microscopy | en |
dc.subject | Bi4Ti 3O12 | en |
dc.subject | Transmission electron microscopy | en |
dc.subject | Atomic vapor deposition | en |
dc.subject | Thin film growth | en |
dc.subject | Bismuth | en |
dc.subject | Titanium | en |
dc.subject | Atomic force microscopy | en |
dc.title | Atomic vapor deposition of bismuth titanate thin films | en |
dc.type | Article (peer-reviewed) | en |
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