Effect of alkanethiol chain length on the oxidation resistance of self-assembled monolayer passivated Ge(100) surfaces

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dc.check.date08/06/2025
dc.check.infoAccess to this article is restricted until 24 months after publication by request of the publisher
dc.contributor.authorGarvey, Shaneen
dc.contributor.authorMaccioni, Barbaraen
dc.contributor.authorSerino, Andrew C.en
dc.contributor.authorHolmes, Justin D.en
dc.contributor.authorNolan, Michaelen
dc.contributor.authorDraeger, Nerissaen
dc.contributor.authorLong, Brendaen
dc.contributor.funderEnterprise Ireland
dc.contributor.funderLam Research
dc.date.accessioned2023-11-15T16:13:09Z
dc.date.available2023-11-09T11:34:57Zen
dc.date.available2023-11-15T16:13:09Z
dc.date.issued2023-06-08
dc.date.updated2023-11-09T11:34:59Zen
dc.description.abstractThe use of self-assembled monolayers (SAMs) of heteroalkanes as passivation layers to protect against oxidation has been studied on a variety of materials. However, typically heteroalkanes with C8 and longer have been used, since the contributing van der Waals between the carbon chains is a significant stabilising force and the longer the chain the greater the force. The industry requirement for passivating semiconducting materials is that they remain oxide free for a queue time of 24 h. The remit of this study is to explore whether passivation using shorter chain alkanethiols, which would be beneficial for reducing carbon, will work to prevent re-oxidation over this time frame. A series of 1-alkanethiols, with chain lengths from C2 to C12 are used to create SAMs on Ge(100) and a study of the re-oxidation of the passivated Ge upon exposure to ambient conditions is undertaken in an effort to determine how chain length effects oxidation resistance of the passivated Ge. X-ray photoelectron spectroscopy is used, complimented by water contact angle measurements to show that the longer thiol molecules outperform their shorter-chain counterparts at inhibiting re-oxidation over 168 h of exposure to ambient. Nonetheless, Ge surfaces passivated by the short-chain thiols, down to C4, still display acceptable resistance to re-oxidation. Finally, a detailed summary of density functional theory simulations whereby the most stable SAM structures and coverages are explored.en
dc.description.sponsorshipEnterprise Ireland (EI IP 2018 0757A)
dc.description.statusPeer revieweden
dc.description.versionAccepted Version
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid139875
dc.identifier.citationGarvey, S., Maccioni, B., Serino, A. C., Holmes, J. D., Nolan, M., Draeger, N. and Long, B. (2023) 'Effect of alkanethiol chain length on the oxidation resistance of self-assembled monolayer passivated Ge (100) surfaces', Thin Solid Films, 778, p.139875 (9pp). doi: 10.1016/j.tsf.2023.139875
dc.identifier.doi10.1016/j.tsf.2023.139875en
dc.identifier.eissn1879-2731
dc.identifier.endpage9
dc.identifier.issn0040-6090
dc.identifier.journaltitleThin Solid Films
dc.identifier.startpage1
dc.identifier.urihttps://hdl.handle.net/10468/15234
dc.identifier.volume778
dc.language.isoenen
dc.publisherElsevier B.V.
dc.rights© 2023, Elsevier B.V. All rights reserved. This manuscript version is made available under the CC BY-NC-ND 4.0 license.
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subjectAlkanethiols
dc.subjectGermanium
dc.subjectOxidation resistance
dc.subjectPassivation
dc.subjectSelf-assembled monolayers
dc.subjectSemiconductor
dc.titleEffect of alkanethiol chain length on the oxidation resistance of self-assembled monolayer passivated Ge(100) surfacesen
dc.typeArticle (peer-reviewed)
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