Solution processable broadband transparent mixed metal oxide nanofilm optical coatings via substrate diffusion doping

dc.contributor.authorGlynn, Colm
dc.contributor.authorAureau, Damien
dc.contributor.authorCollins, Gillian
dc.contributor.authorO'Hanlon, Sally
dc.contributor.authorEtcheberry, Arnaud
dc.contributor.authorO'Dwyer, Colm
dc.contributor.funderIrish Research Councilen
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2018-05-10T09:24:10Z
dc.date.available2018-05-10T09:24:10Z
dc.date.issued2015-11-12
dc.date.updated2018-05-03T08:00:12Z
dc.description.abstractDevices composed of transparent materials, particularly those utilizing metal oxides, are of significant interest due to increased demand from industry for higher fidelity transparent thin film transistors, photovoltaics and a myriad of other optoelectronic devices and optics that require more cost-effective and simplified processing techniques for functional oxides and coatings. Here, we report a facile solution processed technique for the formation of a transparent thin film through an inter-diffusion process involving substrate dopant species at a range of low annealing temperatures compatible with processing conditions required by many state-of-the-art devices. The inter-diffusion process facilitates the movement of Si, Na and O species from the substrate into the as-deposited vanadium oxide thin film forming a composite fully transparent V0.0352O0.547Si0.4078Na0.01. Thin film X-ray diffraction and Raman scattering spectroscopy show the crystalline component of the structure to be [small alpha]-NaVO3 within a glassy matrix. This optical coating exhibits high broadband transparency, exceeding 90-97% absolute transmission across the UV-to-NIR spectral range, while having low roughness and free of surface defects and pinholes. The production of transparent films for advanced optoelectronic devices, optical coatings, and low- or high-k oxides is important for planar or complex shaped optics or surfaces. It provides opportunities for doping metal oxides to ternary, quaternary or other mixed metal oxides on glass, encapsulants or other substrates that facilitate diffusional movement of dopant species.en
dc.description.sponsorshipIrish Research Council ((RS/2011/797), Irish Research Council Ulysses Scheme and from a New Foundations Award); Science Foundation Ireland (SFI under the National Access Programme (NAP 417))en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationGlynn, C., Aureau, D., Collins, G., O'Hanlon, S., Etcheberry, A. and O'Dwyer, C. (2015) 'Solution processable broadband transparent mixed metal oxide nanofilm optical coatings via substrate diffusion doping', Nanoscale, 7(47), pp. 20227-20237. doi: 10.1039/C5NR06184Aen
dc.identifier.doi10.1039/C5NR06184A
dc.identifier.endpage20237en
dc.identifier.issn2040-3364
dc.identifier.journaltitleNanoscaleen
dc.identifier.startpage20227en
dc.identifier.urihttps://hdl.handle.net/10468/6055
dc.identifier.volume7en
dc.language.isoenen
dc.publisherRoyal Society of Chemistry (RSC)en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Technology and Innovation Development Award (TIDA)/13/TIDA/E2761/IE/LiONSKIN - Moldable Li-ion battery outer skin for electronic devices/en
dc.relation.urihttp://pubs.rsc.org/en/content/articlelanding/2015/nr/c5nr06184a#!divAbstract
dc.rights© The Royal Society of Chemistry 2015en
dc.subjectThin filmsen
dc.subjectAnnealing temperaturesen
dc.subjectCrystalline componentsen
dc.subjectOther opto-electronic devicesen
dc.subjectRaman scattering spectroscopyen
dc.subjectState-of-the-art devicesen
dc.subjectThin film x-ray diffractionsen
dc.subjectTransparent thin film transistoren
dc.subjectVanadium oxide thin filmsen
dc.titleSolution processable broadband transparent mixed metal oxide nanofilm optical coatings via substrate diffusion dopingen
dc.typeArticle (peer-reviewed)en
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