Fully CMOS-compatible top-down fabrication of sub-50 nm silicon nanowire sensing devices

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© 2014 Elsevier B.V. This submitted manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/  To access the published work, see http://dx.doi.org/10.1016/j.mee.2013.12.031 Except where otherwise noted, this item's license is described as © 2014 Elsevier B.V. This submitted manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/ To access the published work, see http://dx.doi.org/10.1016/j.mee.2013.12.031
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