Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)

Show simple item record Collins, Gillian Aureau, Damien Holmes, Justin D. Etcheberry, Arnaud O'Dwyer, Colm 2016-02-15T14:33:51Z 2016-02-15T14:33:51Z 2014-11-14
dc.identifier.citation Collins, G., Aureau, D., Holmes, J. D., Etcheberry, A. and O’Dwyer, C. (2014) 'Germanium Oxide Removal by Citric Acid and Thiol Passivation from Citric Acid-Terminated Ge(100)', Langmuir, 30(47), pp. 14123-14127. doi: 10.1021/la503819z en
dc.identifier.volume 30 en
dc.identifier.issued 47 en
dc.identifier.startpage 14123 en
dc.identifier.endpage 14127 en
dc.identifier.issn 0743-7463
dc.identifier.doi 10.1021/la503819z
dc.description.abstract Many applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H–X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid-treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by X-ray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure. en
dc.description.sponsorship Irish Research Council (Ulysses Research Programme with Campus France) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher American Chemical Society en
dc.rights © 2014 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see en
dc.subject Fourier transform infrared spectroscopy en
dc.subject FTIR en
dc.subject X-ray photoelectron spectroscopy en
dc.subject XPS en
dc.subject Ge(111) en
dc.subject Surface functionalization en
dc.subject Ge nanowires en
dc.subject Silicon en
dc.subject Nanoparticles en
dc.subject Germanium en
dc.title Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100) en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: en
dc.internal.authorcontactother Colm O'Dwyer, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: en
dc.internal.availability Full text available en 2014-12-15T11:12:40Z
dc.description.version Accepted Version en
dc.internal.rssid 282719390
dc.internal.rssid 281056184
dc.contributor.funder Irish Research Council en
dc.contributor.funder Campus France en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Langmuir en
dc.internal.copyrightchecked No. !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress en
dc.internal.IRISemailaddress en

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