Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)

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dc.contributor.authorCollins, Gillian
dc.contributor.authorAureau, Damien
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorEtcheberry, Arnaud
dc.contributor.authorO'Dwyer, Colm
dc.contributor.funderIrish Research Councilen
dc.contributor.funderCampus Franceen
dc.date.accessioned2016-02-15T14:33:51Z
dc.date.available2016-02-15T14:33:51Z
dc.date.issued2014-11-14
dc.date.updated2014-12-15T11:12:40Z
dc.description.abstractMany applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H–X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid-treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by X-ray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure.en
dc.description.sponsorshipIrish Research Council (Ulysses Research Programme with Campus France)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationCollins, G., Aureau, D., Holmes, J. D., Etcheberry, A. and O’Dwyer, C. (2014) 'Germanium Oxide Removal by Citric Acid and Thiol Passivation from Citric Acid-Terminated Ge(100)', Langmuir, 30(47), pp. 14123-14127. doi: 10.1021/la503819zen
dc.identifier.doi10.1021/la503819z
dc.identifier.endpage14127en
dc.identifier.issn0743-7463
dc.identifier.issued47en
dc.identifier.journaltitleLangmuiren
dc.identifier.startpage14123en
dc.identifier.urihttps://hdl.handle.net/10468/2288
dc.identifier.volume30en
dc.language.isoenen
dc.publisherAmerican Chemical Societyen
dc.relation.urihttp://pubs.acs.org/doi/abs/10.1021/la503819z
dc.rights© 2014 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/la503819zen
dc.subjectFourier transform infrared spectroscopyen
dc.subjectFTIRen
dc.subjectX-ray photoelectron spectroscopyen
dc.subjectXPSen
dc.subjectGe(111)en
dc.subjectSurface functionalizationen
dc.subjectGe nanowiresen
dc.subjectSiliconen
dc.subjectNanoparticlesen
dc.subjectGermaniumen
dc.titleGermanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)en
dc.typeArticle (peer-reviewed)en
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