Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)
Additional file 1: Supporting Information
Holmes, Justin D.
American Chemical Society
Many applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H–X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid-treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by X-ray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure.
Fourier transform infrared spectroscopy , FTIR , X-ray photoelectron spectroscopy , XPS , Ge(111) , Surface functionalization , Ge nanowires , Silicon , Nanoparticles , Germanium
Collins, G., Aureau, D., Holmes, J. D., Etcheberry, A. and O’Dwyer, C. (2014) 'Germanium Oxide Removal by Citric Acid and Thiol Passivation from Citric Acid-Terminated Ge(100)', Langmuir, 30(47), pp. 14123-14127. doi: 10.1021/la503819z
© 2014 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/la503819z