Studying chemical vapor deposition processes with theoretical chemistry

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dc.contributor.author Pedersen, Henrik
dc.contributor.author Elliott, Simon D.
dc.date.accessioned 2016-03-08T17:41:40Z
dc.date.available 2016-03-08T17:41:40Z
dc.date.issued 2014-03-18
dc.identifier.citation PEDERSEN, H. & ELLIOTT, S. D. 2014. Studying chemical vapor deposition processes with theoretical chemistry. Theoretical Chemistry Accounts, 133, 1-10. http://dx.doi.org/10.1007/s00214-014-1476-7 en
dc.identifier.volume 133 en
dc.identifier.issued 5 en
dc.identifier.startpage 1476 en
dc.identifier.endpage 1486 en
dc.identifier.issn 1432-2234
dc.identifier.issn 1432-881X
dc.identifier.uri http://hdl.handle.net/10468/2423
dc.identifier.doi 10.1007/s00214-014-1476-7
dc.description.abstract In a chemical vapor deposition (CVD) process, a thin film of some material is deposited onto a surface via the chemical reactions of gaseous molecules that contain the atoms needed for the film material. These chemical reactions take place on the surface and in many cases also in the gas phase. To fully understand the chemistry in the process and thereby also have the best starting point for optimizing the process, theoretical chemical modeling is an invaluable tool for providing atomic-scale detail on surface and gas phase chemistry. This overview briefly introduces to the non-expert the main concepts, history and application of CVD, including the pulsed CVD variant known as atomic layer deposition, and put into perspective the use of theoretical chemistry in modeling these processes. en
dc.description.sponsorship Science Foundation Ireland (ALDesign project, 09/IN.1/I2628) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Springer en
dc.relation.uri http://​www.​tyndall.​ie/​aldesign
dc.rights © Springer-Verlag Berlin Heidelberg 2014. The final publication is available at Springer via http://dx.doi.org/10.1007/s00214-014-1476-7 en
dc.subject Atomic layer deposition (ALD) en
dc.subject Thin films en
dc.subject Surface chemistry en
dc.subject Gas phase chemistry en
dc.subject Theoretical chemistry en
dc.subject Chemical vapor deposition (CVD) en
dc.subject ALD en
dc.subject Atomic layer deposition en
dc.title Studying chemical vapor deposition processes with theoretical chemistry en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Simon Elliott, Tyndall Theory Modelling & Design Centre, University College Cork, Cork, Ireland. +353-21-490-3000 Email: simon.elliott@tyndall.ie en
dc.internal.availability Full text available en
dc.date.updated 2015-04-13T15:40:02Z
dc.description.version Accepted Version en
dc.internal.rssid 283617571
dc.contributor.funder Science Foundation Ireland en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Theoretical Chemistry Accounts en
dc.internal.copyrightchecked Yes. !!CORA!! AV + set statement + 12 month embargo. en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress simon.elliott@tyndall.ie en


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