Advancing atomic nanolithography: cold atomic Cs beam exposure of alkanethiol self-assembled monolayers

Show simple item record O'Dwyer, Colm Gay, G. Viaris de Lesegno, B. Weiner, J. Mutzel, M. Haubrich, D. Meschede, D. Ludolph, K. Georgiev, G. Oesterschulze, E. 2016-07-05T14:43:48Z 2016-07-05T14:43:48Z 2005-01
dc.identifier.citation O'Dwyer, C., Gay, G., Lesegno, B., Viaris de,Weiner, J., Mutzel, M., Haubrich, D., Meschede, D., udolph, K., Georgiev, G. and Oesterschulze, E. (2005) 'Advancing atomic nanolithography: cold atomic Cs beam exposure of alkanethiol self-Assembled monolayers', Journal of Physics: Conference Series, 19, pp. 109-117. en
dc.identifier.volume 19 en
dc.identifier.startpage 109 en
dc.identifier.endpage 117 en
dc.identifier.issn 1742-6588
dc.identifier.issn 1742-6596
dc.identifier.doi 10.1088/1742-6596/19/1/019
dc.description.abstract We report the results of a study into the quality of functionalized surfaces for nanolithographic imaging. Self-assembled monolayer (SAM) coverage, subsequent post-etch pattern definition and minimum feature size all depend on the quality of the Au substrate used in atomic nanolithographic experiments. We find sputtered Au substrates yield much smoother surfaces and a higher density of {111} oriented grains than evaporated Au surfaces. A detailed study of the self-assembly mechanism using molecular resolution AFM and STM has shown that the monolayer is composed of domains with sizes typically of 5-25 nm, and multiple molecular domains can exist within one Au grain. Exposure of the SAM to an optically-cooled atomic Cs beam traversing a two-dimensional array of submicron material masks ans also standing wave optical masks allowed determination of the minimum average Cs dose (2 Cs atoms per SAM molecule) and the realization of < 50 nm structures. The SAM monolayer contains many non-uniformities such as pin-holes, domain boundaries and monoatomic depressions which are present in the Au surface prior to SAM adsorption. These imperfections limit the use of alkanethiols as a resist in atomic nanolithography experiments. These studies have allowed us to realize an Atom Pencil suitable for deposition of precision quantities of material at the microand nanoscale to an active surface. en
dc.description.sponsorship European Commission (European Community’s Human Potential Programme under contract HPRN-CT-2002-00304.) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher IOP Publishing en
dc.rights © 2005 IOP Publishing Ltd. en
dc.subject Functionalized surfaces en
dc.subject Nanolithographic imaging en
dc.subject Nanolithograpy en
dc.subject Self-assembled monolayer en
dc.subject Atom pencil en
dc.title Advancing atomic nanolithography: cold atomic Cs beam exposure of alkanethiol self-assembled monolayers en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Colm O'Dwyer, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: en
dc.internal.availability Full text available en 2012-11-30T11:06:15Z
dc.description.version Accepted Version en
dc.internal.rssid 162343083
dc.contributor.funder European Commission en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Journal of Physics: Conference Series en
dc.internal.copyrightchecked No. !!CORA!! Yes en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress en

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