Citation:Carvajal, J. J., Mena, J., Aixart, J., O'Dwyer, C., Díaz, F. and Aguiló, M. (2017) 'Rectifiers, MOS Diodes and LEDs Made of Fully Porous GaN Produced by Chemical Vapor Deposition', ECS Journal of Solid State Science and Technology, 6(10), pp. R143-R148. doi: 10.1149/2.0041710jss
Here we present the fabrication of LEDs based on porous GaN produced by chemical vapor deposition (CVD) and reviewed the work done that allowed demonstrating p-n junction rectifiers and MOS diodes in a simple manner and without involving post-growth steps to induce porosity. p-n junction rectifiers exhibited stable rectification in the range ±1–±5 V, with very stable values of current with time. MOS diodes were fabricated in a single growth step formed by a MgO dielectric interlayer in between Mg-doped porous GaN and a Mg-Ga metallic alloy. Despite the high resistivity observed in the LEDs fabricated, that induced a turn on voltage of ∼13 V, the emission consisted only in one peak centered at 542 nm. Our porous GaN films exhibit random porosity when compared to arrays of nanostructures, however, their easy deposition over large areas without dominating leakage currents is promising for wideband gap applications.
Klejna, Sylwia; Elliott, Simon D.(American Chemical Society, 2014-02-21)
The pairing of high-k dielectric materials with high electron mobility semiconductors for transistors is facilitated when atomic layer deposition (ALD) is used to deposit the dielectric film. An interfacial cleaning mechanism ...
Díaz, Carlos; Valenzuela, María Luisa; Laguna, Antonio; Lavayen, Vladimir; Jimenez, Josefina; Power, Lynn A.; O'Dwyer, Colm(American Chemical Society (ACS), 2010-04-09)
We present a method for the preparation and deposition of metallic microstructures and nanostructures deposited on silicon and silica surfaces by pyrolysis in air at 800 °C of the corresponding metallophosphazene (cyclic ...
Pedersen, Henrik; Elliott, Simon D.(Springer, 2014-03-18)
In a chemical vapor deposition (CVD) process, a thin film of some material is deposited onto a surface via the chemical reactions of gaseous molecules that contain the atoms needed for the film material. These chemical ...
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