Rectifiers, MOS diodes and LEDs made of fully porous GaN produced by chemical vapor deposition

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Carvajal, Joan J.
Mena, Josue
Aixart, J.
O'Dwyer, Colm
Diaz, Francesc
Aguilo, Magdalena
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Here we present the fabrication of LEDs based on porous GaN produced by chemical vapor deposition (CVD) and reviewed the work done that allowed demonstrating p-n junction rectifiers and MOS diodes in a simple manner and without involving post-growth steps to induce porosity. p-n junction rectifiers exhibited stable rectification in the range ±1–±5 V, with very stable values of current with time. MOS diodes were fabricated in a single growth step formed by a MgO dielectric interlayer in between Mg-doped porous GaN and a Mg-Ga metallic alloy. Despite the high resistivity observed in the LEDs fabricated, that induced a turn on voltage of ∼13 V, the emission consisted only in one peak centered at 542 nm. Our porous GaN films exhibit random porosity when compared to arrays of nanostructures, however, their easy deposition over large areas without dominating leakage currents is promising for wideband gap applications.
Chemical vapor deposition , Chemical vapor depositions (CVD) , Dielectric interlayers , Growth steps , High resistivity , Metallic alloys , P-n junction , Turn-on voltages , Wide band gap , Binary alloys , Deposition , Diodes , Electric rectifiers , Gallium alloys , Gallium compounds , Gallium nitride , Leakage currents , Light emitting diodes , Magnesium alloys , Magnesium compounds , Porosity , Semiconductor junctions , Vapor deposition
Carvajal, J. J., Mena, J., Aixart, J., O'Dwyer, C., Díaz, F. and Aguiló, M. (2017) 'Rectifiers, MOS Diodes and LEDs Made of Fully Porous GaN Produced by Chemical Vapor Deposition', ECS Journal of Solid State Science and Technology, 6(10), pp. R143-R148. doi: 10.1149/2.0041710jss
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