Fabrication of MoS2 nanowire arrays and layered structures via the self-assembly of block copolymers
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Date
2016-03-01
Authors
Chaudhari, Atul
Ghoshal, Tandra
Shaw, Matthew T.
O'Connell, John
Kelly, Róisín A.
Glynn, Colm
O'Dwyer, Colm
Holmes, Justin D.
Morris, Michael A.
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Volume Title
Publisher
Wiley
Published Version
Abstract
The electronics industry is beginning to show interest in 2D molybdenum disulfide (2D‐MoS2) as a potential device material due to its low band gap and high mobility. However, current methods for its synthesis are not “fab” friendly and require harsh environments and processes. Here, a novel method to prepare MoS2 nanowire arrays and layered structures via self‐assembly of a block copolymer system is reported. Well‐controlled films of microphase separated line‐space nanopatterns have been achieved by solvent annealing process. The self‐assembled films are used as “templates” for the generation of nonstoichometric molybdenum oxide by in situ inclusion technique following UV/Ozone treatment. Well‐ordered array of MoS2 and a layered structure are then prepared by chemical vapor deposition using sulfur powder at lower temperature. The surface morphology, crystal structure, and phases are examined by different microscopic and spectroscopic techniques. This strategy can be extended to several other 2D materials systems and open the pathway toward better optoelectronic and nanoelectromechanical systems.
Description
Keywords
2D-MoS2 , Block copolymers , Self-assembly , Sulfurization
Citation
Chaudhari, A., Ghoshal, T., Shaw, M. T., O'Connell, J., Kelly, Roisin A., Glynn C., O'Dwyer C., Holmes, J. D. and Morris, M A. (2016) 'Fabrication of MoS2 Nanowire Arrays and Layered Structures via the Self‐Assembly of Block Copolymers', Advanced Materials Interfaces, 3(11), 1500596 (9 pp). doi: 10.1002/admi.201500596
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© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is the peer reviewed version of the following article: (2016). Fabrication of MoS2 Nanowire Arrays and Layered Structures via the Self‐Assembly of Block Copolymers. Adv. Mater. Interfaces, 3: 1500596, which has been published in final form at https://doi.org/10.1002/admi.201500596. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.