Alkane and alkanethiol passivation of halogenated Ge nanowires

Thumbnail Image
Files
Date
2010-11-16
Authors
Collins, Gillian
Fleming, Peter G.
Barth, Sven
O'Dwyer, Colm
Boland, John J.
Morris, Michael A.
Holmes, Justin D.
Journal Title
Journal ISSN
Volume Title
Publisher
American Chemical Society (ACS)
Published Version
10.1021/cm1023986
Research Projects
Organizational Units
Journal Issue
Abstract
The ambient stability and surface coverage of halogen (Cl, Br, and I) passivated germanium nanowires were investigated by X-ray photoelectron and X-ray photoelectron emission spectroscopy. After exposure to air for 24 h, the stability of the halogen-terminated Ge nanowire surfaces toward reoxidation was found to improve with the increasing size of the halogen atoms, i.e., I > Br > Cl. Halogen termination was effective in removing the native Ge oxide (GeOx) and could also be utilized for further functionalization. Functionalization of the halogenated Ge nanowires was investigated using alkyl Grignard reagents and alkanethiols. The stability of the alkyl and alkanethiol passivation layers from the different halogen-terminated surfaces was investigated by X-ray photoelectron spectroscopy and attenuated total reflectance infrared spectroscopy. Alkanethiol functionalized nanowires showed greater resistance against reoxidation of the Ge surface compared to alkyl functionalization when exposed to ambient conditions for 1 week.
Description
Keywords
Iodine , Alkylation , Bromine , Chlorine , Electrons , Emission spectroscopy , Germanium , Halogenation , Infrared spectroscopy , Nanowires , Paraffins , Passivation , Photons , X ray photoelectron spectroscopy , X rays
Citation
Collins, G., Fleming, P., Barth, S., O'Dwyer, C., Boland, J. J., Morris, M. A. and Holmes, J. D. (2010) 'Alkane and Alkanethiol Passivation of Halogenated Ge Nanowires', Chemistry of Materials, 22(23), pp. 6370-6377. doi: 10.1021/cm1023986
Link to publisher’s version
http://pubs.acs.org/doi/10.1021/cm1023986
URI
https://hdl.handle.net/10468/6652
Collections
Chemistry - Journal Articles
Tyndall National Institute - Journal Articles
Copyright
© 2010 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://pubs.acs.org/doi/10.1021/cm1023986