Solvent vapor annealing of block copolymers in confined topographies: commensurability considerations for nanolithography
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Accepted version
Date
2015-02-19
Authors
Cummins, Cian
Kelly, Róisín A.
Gangnaik, Anushka S.
Georgiev, Yordan M.
Petkov, Nikolay
Holmes, Justin D.
Morris, Michael A.
Journal Title
Journal ISSN
Volume Title
Publisher
Wiley
Published Version
Abstract
The directed self-assembly of block copolymer (BCP) materials in topographically patterned substrates (i.e., graphoepitaxy) is a potential methodology for the continued scaling of nanoelectronic device technologies. In this Communication, an unusual feature size variation in BCP nanodomains under confi nement with graphoepitaxially aligned cylinder-forming poly(styrene)- block -poly(4-vinylpyridine) (PS- b -P4VP) BCP is reported. Graphoepitaxy of PS- b -P4VP BCP line patterns (C II ) is accomplished via topography in hydrogen silsequioxane (HSQ) modified substrates and solvent vapor annealing (SVA). Interestingly, reduced domain sizes in features close to the HSQ guiding features are observed. The feature size reduction is evident after inclusion of alumina into the P4VP domains followed by pattern transfer to the silicon substrate. It is suggested that this nanodomain size perturbation is due to solvent swelling effects during SVA. It is proposed that using a commensurability
value close to the solvent vapor annealed periodicity will alleviate this issue leading to uniform nanofins.
Description
Keywords
Block copolymers , Commensurability , Directed self‐assembly , Graphoepitaxy , Pattern transfer , Solvent vapor annealing
Citation
Cummins, C., Kelly, R. A., Gangnaik, A., Georgiev, Y. M., Petkov, N., Holmes, J. D. and Morris, M. A. (2015) 'Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography', Macromolecular Rapid Communications, 36(8), pp. 762-767. doi: 10.1002/marc.201400722
Copyright
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is the peer reviewed version of the following article: (2015), Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography. Macromol. Rapid Commun., 36: 762-767, which has been published in final form at https://doi.org/10.1002/marc.201400722. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.