Resonant gratings with an etch-stop layer and a fabrication-error tolerant design

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dc.contributor.author Hogan, Brian
dc.contributor.author Lewis, Liam
dc.contributor.author Romero-Vivas, Javier
dc.contributor.author Ochalski, Tomasz J.
dc.contributor.author Hegarty, Stephen P.
dc.date.accessioned 2018-09-24T12:36:56Z
dc.date.available 2018-09-24T12:36:56Z
dc.date.issued 2018
dc.identifier.citation Hogan, B., Lewis, L., Romero-Vivas, J., Ochalski, T. J. and Hegarty, S. P. (2018) 'Resonant gratings with an etch-stop layer and a fabrication-error tolerant design', Optics Express, 26(10), pp. 13205-13213. doi: 10.1364/OE.26.013205 en
dc.identifier.volume 26
dc.identifier.issued 10
dc.identifier.startpage 13205
dc.identifier.endpage 13213
dc.identifier.issn 1094-4087
dc.identifier.uri http://hdl.handle.net/10468/6870
dc.identifier.doi 10.1364/OE.26.013205
dc.description.abstract Sub-wavelength gratings (SWG) have shown much promise for applications such as lightweight high bandwidth reflectors, polarising filters and focusing lenses. Unfortunately, grating performance may be rapidly degraded through variability in grating dimensions. We demonstrate, in particular, how an error in depth of etch can be detrimental to the performance of zero contrast grating reflectors. We mitigate the impact of this fabrication error through the introduction of an etch stop layer and in so doing we experimentally realise a high bandwidth reflector based on this modified structure. Another common fabrication error is variation in the duty-cycle of fabricated gratings. This duty-cycle variation can weaken grating performance, however we demonstrate that grating designs that exhibit tolerance to duty-cycle fluctuation can be identified through simulation. Finally, we discuss the impact of lateral etching and the resulting sidewall concavity. We present our approach for numerically predicting the spectral response from such a grating and also for convenience we outline an approach for quickly approximating grating performance. Good agreement is observed between these numerical predictions and measurements made on a HCG with concave sidewalls. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Optical Society of America en
dc.relation.uri https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-10-13205
dc.rights © 2018, Optical Society of America under the terms of the OSA Open Access Publishing Agreement en
dc.subject High-contrast gratings en
dc.subject Coupled-wave A nalysis en
dc.subject Reflectors en
dc.subject Implementation en
dc.subject Filters en
dc.title Resonant gratings with an etch-stop layer and a fabrication-error tolerant design en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Brian Hogan, Tyndall National Institute, University College Cork, Cork, Ireland. +353-21-490-3000 Email: brian.hogan@tyndall.ie en
dc.internal.availability Full text available en
dc.description.version Published Version en
dc.contributor.funder Science Foundation Ireland
dc.description.status Peer reviewed en
dc.identifier.journaltitle Optics Express en
dc.internal.IRISemailaddress brian.hogan@tyndall.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Industry Fellowship/15/IFB/3626/IE/Innovative protocol for the development of nanoporous/nanostructured materials patterning using block copolymer lithography for advanced optoelectronic thermal management/
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/


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