Area selective atomic layer deposition of Si-based materials

Files in this item

This item appears in the following Collection(s)

© 2019, Ekaterina Filatova. Except where otherwise noted, this item's license is described as © 2019, Ekaterina Filatova.
This website uses cookies. By using this website, you consent to the use of cookies in accordance with the UCC Privacy and Cookies Statement. For more information about cookies and how you can disable them, visit our Privacy and Cookies statement