The atom pencil: serial writing in the sub-micrometre domain

Mutzel, M.; Muller, M.; Haubrich, D.; Rasbach, U.; Meschede, D.; O'Dwyer, Colm; Gay, G.; Viaris de Lesegno, B.; Weiner, J.; Ludolph, K.; Georgiev, G.; Oesterschulze, E.

The atom pencil: serial writing in the sub-micrometre domain

Files

MM_atomSV2005.pdf(922.56 KB)

Date

2005-01

Authors

Mutzel, M.

Muller, M.

Haubrich, D.

Rasbach, U.

Meschede, D.

O'Dwyer, Colm

Gay, G.

Viaris de Lesegno, B.

Weiner, J.

Ludolph, K.

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Publisher

Springer

Published Version

10.1007/s00340-005-1863-9

Abstract

The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture.

Keywords

Microscale , Quantum optics , Photoionization and excitation , Atom lithography , Nanometer scale , Atomic nanofabrication

Citation

MÜTZEL, M., MÜLLER, M., HAUBRICH, D., RASBACH, U., MESCHEDE, D., O’DWYER, C., GAY, G., LESEGNO, B. V., WEINER, J., LUDOLPH, K., GEORGIEV, G. & OESTERSCHULZE, E. (2005). The atom pencil: serial writing in the sub-micrometre domain. Applied Physics B, 80, 941-944. doi: 10.1007/s00340-005-1863-9