The atom pencil: serial writing in the sub-micrometre domain
Mutzel, M.; Muller, M.; Haubrich, D.; Rasbach, U.; Meschede, D.; O'Dwyer, Colm; Gay, G.; Viaris de Lesegno, B.; Weiner, J.; Ludolph, K.; Georgiev, G.; Oesterschulze, E.
Date:
2005-01
Copyright:
© Springer-Verlag 2005. The original publication is available at www.springerlink.com
Citation:
MÜTZEL, M., MÜLLER, M., HAUBRICH, D., RASBACH, U., MESCHEDE, D., O’DWYER, C., GAY, G., LESEGNO, B. V., WEINER, J., LUDOLPH, K., GEORGIEV, G. & OESTERSCHULZE, E. (2005). The atom pencil: serial writing in the sub-micrometre domain. Applied Physics B, 80, 941-944. doi: 10.1007/s00340-005-1863-9
Abstract:
The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture.
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