The atom pencil: serial writing in the sub-micrometre domain

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Date
2005-01
Authors
Mutzel, M.
Muller, M.
Haubrich, D.
Rasbach, U.
Meschede, D.
O'Dwyer, Colm
Gay, G.
Viaris de Lesegno, B.
Weiner, J.
Ludolph, K.
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Springer
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Abstract
The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture.
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Keywords
Microscale , Quantum optics , Photoionization and excitation , Atom lithography , Nanometer scale , Atomic nanofabrication
Citation
MÜTZEL, M., MÜLLER, M., HAUBRICH, D., RASBACH, U., MESCHEDE, D., O’DWYER, C., GAY, G., LESEGNO, B. V., WEINER, J., LUDOLPH, K., GEORGIEV, G. & OESTERSCHULZE, E. (2005). The atom pencil: serial writing in the sub-micrometre domain. Applied Physics B, 80, 941-944. doi: 10.1007/s00340-005-1863-9
Copyright
© Springer-Verlag 2005. The original publication is available at www.springerlink.com