Microthermography of diode lasers: The impact of light propagation on image formation

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dc.contributor.authorLeClech, Julien
dc.contributor.authorZiegler, Mathias
dc.contributor.authorMukherjee, Jayanta
dc.contributor.authorTomm, Jens W.
dc.contributor.authorElsaesser, Thomas
dc.contributor.authorLandesman, Jean-Pierre
dc.contributor.authorCorbett, Brian M.
dc.contributor.authorMcInerney, John G.
dc.contributor.authorReithmaier, Johann Peter
dc.contributor.authorDeubert, Stefan
dc.contributor.authorForchel, Alfred
dc.contributor.authorNakwaski, Wlodzimierz
dc.contributor.authorSarzala, Robert P.
dc.contributor.funderSixth Framework Programme
dc.date.accessioned2017-07-12T09:07:44Z
dc.date.available2017-07-12T09:07:44Z
dc.date.issued2009-01-06
dc.description.abstractWe analyze the effect of propagating infrared thermal radiation within a diode laser on its thermal image taken by a thermocamera. A ray-tracing analysis shows that this effect substantially influences image formation on a spatial scale of 10 mu m, i.e., in the domain of microthermography. The main parameter affecting the thermal radiation spread in the semitransparent semiconductor structure is the free carrier concentration in the substrate, governing its absorption. Two applications are presented: a quantum dot laser and a quantum-well laser, where independent thermal models are developed using the finite element method (FEM). Our ray-tracing analysis verifies the FEM simulated temperature profiles by interlinking them to experimental temperature maps obtained through microthermography. This represents a versatile experimental method for extracting reliable bulk-temperature data from diode lasers on a microscopic scale.en
dc.description.sponsorshipEuropean Commission (IST-2005-035266);en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid14502
dc.identifier.citationLeClech, J., Ziegler, M., Mukherjee, J., Tomm, J. W., Elsaesser, T., Landesman, J.-P., Corbett, B., Mclnerney, J. G., Reithmaier, J. P., Deubert, S., Forchel, A., Nakwaski, W. and Sarzała, R. P. (2009) 'Microthermography of diode lasers: The impact of light propagation on image formation', Journal of Applied Physics, 105(1), pp. 014502. doi: 10.1063/1.3055356en
dc.identifier.doi10.1063/1.3055356
dc.identifier.endpage6
dc.identifier.issn0021-8979
dc.identifier.issued6
dc.identifier.journaltitleJournal of Applied Physicsen
dc.identifier.startpage1
dc.identifier.urihttps://hdl.handle.net/10468/4218
dc.identifier.volume105
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.urihttp://aip.scitation.org/doi/abs/10.1063/1.3055356
dc.rights© 2009 American Institute of Physics, This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in LeClech, J., Ziegler, M., Mukherjee, J., Tomm, J. W., Elsaesser, T., Landesman, J.-P., Corbett, B., Mclnerney, J. G., Reithmaier, J. P., Deubert, S., Forchel, A., Nakwaski, W. and Sarzała, R. P. (2009) 'Microthermography of diode lasers: The impact of light propagation on image formation', Journal of Applied Physics, 105(1), pp. 014502 and may be found at http://aip.scitation.org/doi/abs/10.1063/1.3055356en
dc.subjectHigh-Poweren
dc.subjectEpitaxyen
dc.subjectChannel waveguidesIon implantationen
dc.subjectField emission microscopyen
dc.subjectThermal imagingen
dc.subjectThermal radiationen
dc.subjectLaser diodesen
dc.subjectQuantum dotsen
dc.titleMicrothermography of diode lasers: The impact of light propagation on image formationen
dc.typeArticle (peer-reviewed)en
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