Metallophosphazene precursor routes to the solid-state deposition of metallic and dielectric microstructures and nanostructures on Si and SiO2

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dc.contributor.authorDíaz, Carlos
dc.contributor.authorValenzuela, María Luisa
dc.contributor.authorLaguna, Antonio
dc.contributor.authorLavayen, Vladimir
dc.contributor.authorJimenez, Josefina
dc.contributor.authorPower, Lynn A.
dc.contributor.authorO'Dwyer, Colm
dc.contributor.funderFondo Nacional de Desarrollo Científico, Tecnológico y de Innovación Tecnológicaen
dc.contributor.funderHigher Education Authorityen
dc.contributor.funderMinisterio de Educación, Cultura y Deporteen
dc.contributor.funderGobierno de Aragónen
dc.date.accessioned2018-06-13T15:25:07Z
dc.date.available2018-06-13T15:25:07Z
dc.date.issued2010-04-09
dc.date.updated2018-06-11T09:31:34Z
dc.description.abstractWe present a method for the preparation and deposition of metallic microstructures and nanostructures deposited on silicon and silica surfaces by pyrolysis in air at 800 °C of the corresponding metallophosphazene (cyclic or polymer). Atomic force microscopy studies reveal that the morphology is dependent on the polymeric or oligomeric nature of the phosphazene precursor, on the preparation method used, and on the silicon substrate surface (crystalline or amorphous) and its prior inductively couple plasma etching treatment. Microscale and nanoscale structures and high-surface-area thin films of gold, palladium, silver, and tin were successfully deposited from their respective newly synthesized precursors. The characteristic morphology of the deposited nanostructures resulted in varied roughness and increased surface area and was observed to be dependent on the precursor and the metal center. In contrast to island formation from noble metal precursors, we also report a coral of SnP2O7 growth on Si and SiO2 surfaces from the respective Sn polymer precursor, leaving a self-affine fractal structure with a well-defined roughness exponent that appears to be independent (within experimental error) of the average size of the islands. The nature of the precursor will be shown to influence the degree of surface features, and the mechanism of their formation is presented. The method reported here constitutes a new route to the deposition of single-crystal metallic, oxidic, and phosphate nanostructures and thin films on technologically relevant substrates.en
dc.description.sponsorshipFondo Nacional de Desarrollo Científico, Tecnológico y de Innovación Tecnológica (FONDECYT project 1085011); Higher Education Authority (under the framework of the INSPIRE programme, funded by the Irish Government’s Programme for Research in Third Level Institutions, Cycle 4, National Development Plan 2007-2013); Ministerio de Educación, Cultura y Deporte (Spanish Ministerio de Educacion y Ciencia (CTQ2007-67273-C02-01));en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationDíaz, C., Valenzuela, M. L., Laguna, A., Lavayen, V., Jiménez, J., Power, L. A. and O’Dwyer, C. (2010) 'Metallophosphazene Precursor Routes to the Solid-State Deposition of Metallic and Dielectric Microstructures and Nanostructures on Si and SiO2', Langmuir, 26(12), pp. 10223-10233. doi: 10.1021/la100371wen
dc.identifier.doi10.1021/la100371w
dc.identifier.endpage10233en
dc.identifier.issn0743-7463
dc.identifier.journaltitleLangmuiren
dc.identifier.startpage10223en
dc.identifier.urihttps://hdl.handle.net/10468/6297
dc.identifier.volume26en
dc.language.isoenen
dc.publisherAmerican Chemical Society (ACS)en
dc.rights© 2010 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/la100371wen
dc.subjectAmorphous siliconen
dc.subjectAtomic force microscopyen
dc.subjectDepositionen
dc.subjectFilm preparationen
dc.subjectGold coatingsen
dc.subjectGold depositsen
dc.subjectMicrostructureen
dc.subjectMorphologyen
dc.subjectNanostructuresen
dc.subjectOligomersen
dc.subjectPalladiumen
dc.subjectPlasma etchingen
dc.subjectPolymersen
dc.subjectPrecious metalsen
dc.subjectPyrolysisen
dc.subjectSilicaen
dc.subjectSilicon oxidesen
dc.subjectSilveren
dc.subjectSubstratesen
dc.subjectSurface roughnessen
dc.subjectThin filmsen
dc.subjectTinen
dc.subjectVapor depositionen
dc.titleMetallophosphazene precursor routes to the solid-state deposition of metallic and dielectric microstructures and nanostructures on Si and SiO2en
dc.typeArticle (peer-reviewed)en
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