Pore size modulation in electrochemically etched macroporous p-type silicon monitored by FFT impedance spectroscopy and Raman scattering

Simple item page
dc.contributor.authorQuiroga-Gonzalez, Enrique
dc.contributor.authorCarstensen, Jurgen
dc.contributor.authorGlynn, Colm
dc.contributor.authorO'Dwyer, Colm
dc.contributor.authorFoll, Helmut
dc.date.accessioned2018-05-11T10:30:58Z
dc.date.available2018-05-11T10:30:58Z
dc.date.issued2013-10-30
dc.date.updated2018-05-03T08:42:01Z
dc.description.abstractThe understanding of the mechanisms of macropore formation in p-type Si with respect to modulation of the pore diameter is still in its infancy. In the present work, macropores with significantly modulated diameters have been produced electrochemically in p-type Si. The effect of the current density and the amount of surfactant in the etching solution are shown to influence the modulation in pore diameter and morphology. Data obtained during the etching process by in situ FFT impedance spectroscopy correlate the pore diameter variation with certain time constants found in the kinetics of the dissolution process. Raman scattering and electron microscopy confirm the mesoscopic structure and roughening of the pore walls. Spectroscopic and microscopic methods confirm that the pore wall morphology is correlated with the conditions of pore modulation.en
dc.description.statusPeer revieweden
dc.description.versionSubmitted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationQuiroga-Gonzalez, E., Carstensen, J., Glynn, C., O'Dwyer, C. and Foll, H. (2014) 'Pore size modulation in electrochemically etched macroporous p-type silicon monitored by FFT impedance spectroscopy and Raman scattering', Physical Chemistry Chemical Physics, 16(1), pp. 255-263. doi: 10.1039/C3CP53600Aen
dc.identifier.doi10.1039/C3CP53600A
dc.identifier.endpage263en
dc.identifier.issn1463-9076
dc.identifier.issued1en
dc.identifier.journaltitlePhysical Chemistry Chemical Physicsen
dc.identifier.startpage255en
dc.identifier.urihttps://hdl.handle.net/10468/6083
dc.identifier.volume16en
dc.language.isoenen
dc.publisherRoyal Society of Chemistry (RSC)en
dc.relation.urihttp://pubs.rsc.org/en/content/articlelanding/2014/cp/c3cp53600a#!divAbstract
dc.rights© the Owner Societies 2014; Royal Society ofChemistryen
dc.subjectMacropore formationen
dc.subjectRaman scatteringen
dc.subjectElectron microscopyen
dc.subjectPore modulationen
dc.subjectSiliconen
dc.subjectp-type Sien
dc.subjectFFT impedance spectroscopyen
dc.titlePore size modulation in electrochemically etched macroporous p-type silicon monitored by FFT impedance spectroscopy and Raman scatteringen
dc.typeArticle (peer-reviewed)en
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
pccp_submission.pdf
Size:
3.56 MB
Format:
Adobe Portable Document Format
Description:
Submitted version
Download
License bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
license.txt
Size:
2.71 KB
Format:
Item-specific license agreed upon to submission
Description:
Download
Collections
Chemistry - Journal Articles
Tyndall National Institute - Journal Articles