Nanoporous domains in n-InP anodized in KOH
dc.contributor.author | Lynch, Robert P. | |
dc.contributor.author | O'Dwyer, Colm | |
dc.contributor.author | Sutton, David | |
dc.contributor.author | Newcomb, Simon B. | |
dc.contributor.author | Buckley, D. Noel | |
dc.date.accessioned | 2018-06-14T11:45:14Z | |
dc.date.available | 2018-06-14T11:45:14Z | |
dc.date.issued | 2007-05 | |
dc.date.updated | 2018-06-11T10:15:42Z | |
dc.description.abstract | A model of porous structure growth in semiconductors based on propagation of pores along the <111>A directions has been developed. The model predicts that pores originating at a surface pit lead to porous domains with a truncated tetrahedral shape. SEM and TEM were used to examine cross- sections of n-InP electrodes in the early stages of anodization in aqueous KOH and showed that pores propagate along the <111>A directions. Domain outlines observed in both TEM and SEM images are in excellent agreement with the model. The model is further supported by plan-view TEM and surface SEM images. Quantitative measurements of aspect ratios of the observed domains are in excellent agreement with the predicted values. | en |
dc.description.status | Peer reviewed | en |
dc.description.version | Accepted Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Lynch, R. P., O'Dwyer, C., Sutton, D., Newcomb, S. B. and Buckley, D. N. (2007) 'Nanoporous Domains in n-InP Anodized in KOH', ECS Transactions, 6(2), pp. 355-366. doi: 10.1149/1.2731203 | en |
dc.identifier.doi | 10.1149/1.2731203 | |
dc.identifier.endpage | 366 | en |
dc.identifier.issn | 1938-5862 | |
dc.identifier.journaltitle | Electrochemical Society Transactions | en |
dc.identifier.startpage | 355 | en |
dc.identifier.uri | https://hdl.handle.net/10468/6305 | |
dc.identifier.volume | 6 | en |
dc.language.iso | en | en |
dc.publisher | Electrochemical Society | en |
dc.relation.ispartof | 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting | |
dc.relation.uri | http://ecst.ecsdl.org/content/6/2/355.abstract | |
dc.rights | © 2007 ECS - The Electrochemical Society | en |
dc.subject | (1 1 0) surface | en |
dc.subject | Anodization | en |
dc.subject | Compound semiconductor (CS) | en |
dc.subject | Cross sections (CS) | en |
dc.subject | Early stages | en |
dc.subject | Electrochemical Society (ECS) | en |
dc.subject | International symposium | en |
dc.subject | Nano porous | en |
dc.subject | Porous domains | en |
dc.subject | Porous structures | en |
dc.subject | Predicted values | en |
dc.subject | Quantitative measurements | en |
dc.subject | Scanning electron microscopy (SEM) images | en |
dc.subject | SEM and TEM | en |
dc.subject | Solution interfaces | en |
dc.title | Nanoporous domains in n-InP anodized in KOH | en |
dc.type | Article (peer-reviewed) | en |