Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings

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dc.contributor.authorFarrell, Richard A.
dc.contributor.authorKehagias, Nikolaos
dc.contributor.authorShaw, Matthew T.
dc.contributor.authorReboud, Vincent
dc.contributor.authorZelsmann, Marc
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorSotomayor Torres, Clivia M.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderSeventh Framework Programmeen
dc.date.accessioned2018-09-19T09:24:51Z
dc.date.available2018-09-19T09:24:51Z
dc.date.issued2011-01-12
dc.date.updated2018-08-06T15:10:28Z
dc.description.abstractThrough a combination of nanoimprint lithography and block copolymer self-assembly, a highly regular dewetting process of a symmetric diblock copolymer occurs whereby the hierarchal formation of microdroplets and concentric nanorings emerges. The process is driven by the unique chemical properties and geometrical layout of the underlying patterned silsesquioxane micrometer-sized templates. Given the presence of nonpreferential substrate−polymer interactions, directed dewetting was utilized to produce uniform arrays of microsized droplets of microphase separated polystyrene-block-poly(methyl methylacrylate) (PS-b-PMMA), following thermal annealing at 180 °C. Microdroplets with diameters greater than 400 nm exhibited a hexagonal close-packed arrangement of nanodots on the surface with polydomain ordering. At the droplet periphery, the polydomain ordering was severely disrupted because of a higher in-plane radius of curvature. By reducing the droplet size, the in-plane radius of curvature of the microdroplet becomes significant and the PMMA cylinders adopt parallel structures in this confined geometry. Continuous scaling of the droplet results in the generation of isolated, freestanding, self-aligned, and self-supported oblique nanorings (long axis ∼250−350 nm), which form as interstitial droplets between the larger microdroplets. Optical and magnetic-based nanostructures may benefit from such hierarchal organization and self-supporting/aligned nanoring templates by combining more than one lithography technique with different resolution capabilities.en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationFarrell, R. A., Kehagias, N., Shaw, M. T., Reboud, V., Zelsmann, M., Holmes, J. D., Sotomayor Torres, C. M. and Morris, M. A. (2011) 'Surface-Directed Dewetting of a Block Copolymer for Fabricating Highly Uniform Nanostructured Microdroplets and Concentric Nanorings', ACS Nano, 5(2), pp. 1073-1085. doi: 10.1021/nn102720men
dc.identifier.doi10.1021/nn102720m
dc.identifier.endpage1085en
dc.identifier.issn1936-0851
dc.identifier.journaltitleACS Nanoen
dc.identifier.startpage1073en
dc.identifier.urihttps://hdl.handle.net/10468/6809
dc.identifier.volume5en
dc.language.isoenen
dc.publisherAmerican Chemical Society (ACS)en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/03/IN.3/I375/IE/The assembly of electronically important materials as structurally and size controlled nanowires into 3-dimensional architectures and construction of Prototype circuitry there from./en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Centre for Science Engineering and Technology (CSET)/03/CE3/M406/IE/CSET CRANN: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN)/en
dc.relation.projectinfo:eu-repo/grantAgreement/EC/FP7::SP1::NMP/214249/EU/Nanopatterning, Production and Applications based on Nanoimprinting Lithography/NAPANILen
dc.relation.urihttps://pubs.acs.org/doi/abs/10.1021/nn102720m
dc.rights© 2011 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/nn102720men
dc.subjectBlock copolymersen
dc.subjectDirected dewettingen
dc.subjectGraphoepitaxyen
dc.subjectMicrodropleten
dc.subjectNanoimprinten
dc.subjectLithographyen
dc.subjectNanoringen
dc.subjectPolystyrene-block-poly(methyl methylacrylate)en
dc.subjectSilsesquioxaneen
dc.titleSurface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanoringsen
dc.typeArticle (peer-reviewed)en
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