Atomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold bright Cs atom beams

Simple item page
dc.contributor.authorO'Dwyer, Colm
dc.contributor.authorGay, G.
dc.contributor.authorViaris de Lesegno, B.
dc.contributor.authorWeiner, J.
dc.contributor.authorCamposeo, A.
dc.contributor.authorTantussi, F.
dc.contributor.authorFuso, F.
dc.contributor.authorAllegrini, M.
dc.contributor.authorArimondo, E.
dc.date.accessioned2016-07-08T10:53:53Z
dc.date.available2016-07-08T10:53:53Z
dc.date.issued2005-06-29
dc.date.updated2012-11-30T11:09:53Z
dc.description.abstractCs atom beams, transversely collimated and cooled, passing through material masks in the form of arrays of reactive-ion-etched hollow Si pyramidal tips and optical masks formed by intense standing light waves, write submicron features on self-assembled monolayers (SAMs). Features with widths as narrow as 43 ± 6 nm and spatial resolution limited only by the grain boundaries of the substrate have been realized in SAMs of alkanethiols. The material masks write two-dimensional arrays of submicron holes; the optical masks result in parallel lines spaced by half the optical wavelength. Both types of feature are written to the substrate by exposure of the masked SAM to the Cs flux and a subsequent wet chemical etch. For the arrays of pyramidal tips, acting as passive shadow masks, the resolution and size of the resultant feature depends on the distance of the mask array from the SAM, an effect caused by the residual divergence of the Cs atom beam. The standing wave optical mask acts as an array of microlenses focusing the atom flux onto the substrate. Atom 'pencils' writing on SAMs have the potential to create arbitrary submicron figures in massively parallel arrays. The smallest features and highest resolutions were realized with SAMs grown on smooth, sputtered gold substrates.en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationO'Dwyer, C., Gay, G., ,de Lesegno, B. V., Weiner, J., Camposeo, A., Tantussi, F., Fuso, F., Allegrini, M. and Arimondo, E. (2005) 'Atomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold bright Cs atom beams'. Nanotechnology, 16(9), 1536. http://stacks.iop.org/0957-4484/16/i=9/a=022en
dc.identifier.doi10.1088/0957-4484/16/9/022
dc.identifier.issn0957-4484
dc.identifier.issued9en
dc.identifier.journaltitleNanotechnologyen
dc.identifier.startpage1536en
dc.identifier.urihttps://hdl.handle.net/10468/2845
dc.identifier.volume16en
dc.language.isoenen
dc.publisherIOP Publishingen
dc.rights© 2005 IOP Publishing Ltd. This is an author-created, un-copyedited version of an article accepted for publication in Nanotechnology. The publisher is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at http://dx.doi.org/10.1088/0957-4484/16/9/022.en
dc.subjectAlcoholsen
dc.subjectAtomic beamsen
dc.subjectCesiumen
dc.subjectEtchingen
dc.subjectGolden
dc.subjectMasksen
dc.subjectNanotechnologyen
dc.subjectSingle crystalsen
dc.subjectSputteringen
dc.subjectAtom fluxen
dc.subjectAtomic nanolithography patterningen
dc.subjectOptical diffraction limiten
dc.subjectSelf assemblyen
dc.titleAtomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold bright Cs atom beamsen
dc.typeArticle (peer-reviewed)en
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
Toulouse__Pisa__ANL.pdf
Size:
1.45 MB
Format:
Adobe Portable Document Format
Description:
Accepted Version
Download
License bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
license.txt
Size:
2.71 KB
Format:
Item-specific license agreed upon to submission
Description:
Download
Collections
Chemistry - Journal Articles
Tyndall National Institute - Journal Articles