Raman scattering spectroscopy of metal-assisted chemically etched rough nanowires

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Date
2011-04
Authors
Glynn, Colm
Lotty, Olan
McSweeney, William
Holmes, Justin D.
O'Dwyer, Colm
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Electrochemical Society
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Abstract
Silicon nanowires were fabricated by a metal assisted chemical (MAC) etching process and routes toward ohmic contacting of substrates for Li-ion battery anode application were developed. Si nanowire layers are comprised of wires that are single crystal with rough outer surfaces. The nanowires are epitaxial with the underlying Si(100) substrate, maintain equivalent doping density and crystal orientation, and are coated with a stoichiometric SiO2. Electrical backside contacting using an In-Ga eutectic allows low-resistance ohmic contacts to low-doped nanowire electrodes for electrochemical testing.
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Keywords
Scattering , Crystal orientation , Nanowires , Phonons , Raman scattering , Semiconducting silicon , Semiconductor doping , Silicon compounds , Single crystals , Substrates , Bulk substrates , Confined phonons , Excitation light , Induced heating , Localized beams , Mesoporous , Metal-assisted chemical etching , Phonon mode , Phonon quantum confinement effects , Raman modes , Raman scattering spectra , Raman scattering spectroscopy , Scattering process , Si nanowire , Si substrates
Citation
McSweeney, W., Lotty, O., Holmes, J. D. and O'Dwyer, C. (2011) 'Fabrication and Characterization of Single-Crystal Metal-Assisted Chemically Etched Rough Si Nanowires for Lithium-Ion Battery Anodes', ECS Transactions, 35(34), pp. 25-34. doi: 10.1149/1.3654199
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© 2011 ECS - The Electrochemical Society