Preferential <111>A pore propagation mechanism in n-InP anodized in KOH
dc.contributor.author | Lynch, Robert P. | |
dc.contributor.author | O'Dwyer, Colm | |
dc.contributor.author | Quill, Nathan | |
dc.contributor.author | Nakahara, Shohei | |
dc.contributor.author | Newcomb, Simon B. | |
dc.contributor.author | Buckley, D. Noel | |
dc.date.accessioned | 2018-06-14T14:44:51Z | |
dc.date.available | 2018-06-14T14:44:51Z | |
dc.date.issued | 2008-10 | |
dc.date.updated | 2018-06-11T10:32:19Z | |
dc.description.abstract | This paper describes the formation of pores during the anodization of n-InP in aqueous KOH. The pores propagate preferentially along the <111>A crystallographic directions and form truncated tetrahedral domains. A model is presented that explains preferential <111>A pore propagation and the uniform diameters of pores. The model outlines how pores can deviate from the <111>A directions and from their characteristic diameters. It also details the effect of variation of carrier concentration on the dimensions of the porous structures. | en |
dc.description.status | Peer reviewed | en |
dc.description.version | Accepted Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Lynch, R., O'Dwyer, C., Quill, N., Nakahara, S., Newcomb, S. B. and Buckley, D. N. (2008) 'Preferential <111>A Pore Propagation Mechanism in n-InP Anodized in KOH', ECS Transactions, 16(3), pp. 393-404. | en |
dc.identifier.doi | 10.1149/1.2982579 | |
dc.identifier.endpage | 404 | en |
dc.identifier.issn | 1938-5862 | |
dc.identifier.journaltitle | Electrochemical Society Transactions | en |
dc.identifier.startpage | 393 | en |
dc.identifier.uri | https://hdl.handle.net/10468/6306 | |
dc.identifier.volume | 16 | en |
dc.language.iso | en | en |
dc.publisher | Electrochemical Society | en |
dc.relation.ispartof | Porous Semiconductors: A Symposium Held in Memory of Vitali Parkhutik and Volker Lehmann - 214th ECS Meeting; Honolulu, HI; United States; 12 October 2008 through 17 October 2008; Code 75747 | |
dc.relation.uri | http://ecst.ecsdl.org/content/16/3/393.abstract | |
dc.rights | © 2008 ECS - The Electrochemical Society | en |
dc.subject | Electric conductivity | en |
dc.subject | Carrier concentration | en |
dc.subject | Crystals | en |
dc.subject | Semiconductor materials | en |
dc.subject | Anodization | en |
dc.subject | Crystallographic directions | en |
dc.subject | Inp | en |
dc.subject | Porous structures | en |
dc.subject | Propagation mechanisms | en |
dc.subject | Uniform diameters | en |
dc.title | Preferential <111>A pore propagation mechanism in n-InP anodized in KOH | en |
dc.type | Article (peer-reviewed) | en |