Improvement in top-gate MoS2 transistor performance due to high quality backside Al2O3 layer
dc.check.date | 2018-07-21 | |
dc.check.info | Access to this article is restricted until 12 months after publication at the request of the publisher. | en |
dc.contributor.author | Bolshakov, Pavel | |
dc.contributor.author | Zhao, Peng | |
dc.contributor.author | Azcatl, Angelica | |
dc.contributor.author | Hurley, Paul K. | |
dc.contributor.author | Wallace, Robert M. | |
dc.contributor.author | Young, Chadwin D. | |
dc.date.accessioned | 2017-07-27T15:05:54Z | |
dc.date.available | 2017-07-27T15:05:54Z | |
dc.date.issued | 2017-07-21 | |
dc.date.updated | 2017-07-27T13:29:54Z | |
dc.description.status | Peer reviewed | en |
dc.description.version | Published Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Bolshakov, P., Zhao, P., Azcatl, A., Hurley, P. K., Wallace, R. M. and Young, C. D. (2017) 'Improvement in top-gate MoS2 transistor performance due to high quality backside Al2O3 layer', Applied Physics Letters, 111(3), pp. 032110. doi:10.1063/1.4995242 | en |
dc.identifier.doi | 10.1063/1.4995242 | |
dc.identifier.endpage | 32110-4 | en |
dc.identifier.issn | 0003-6951 | |
dc.identifier.issued | 3 | en |
dc.identifier.journaltitle | Applied Physics Letters | en |
dc.identifier.startpage | 32110-1 | en |
dc.identifier.uri | https://hdl.handle.net/10468/4278 | |
dc.identifier.volume | 111 | en |
dc.language.iso | en | en |
dc.publisher | AIP Publishing | en |
dc.rights | © 2017, AIP Publishing. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Appl. Phys. Lett. 111, 032110 (2017) and may be found at http://aip.scitation.org/doi/pdf/10.1063/1.4995242 | en |
dc.subject | Alumina | en |
dc.subject | Annealing | en |
dc.subject | Carrier mobility | en |
dc.subject | High-k dielectric thin films | en |
dc.subject | Molybdenum compounds | en |
dc.subject | MOSFET | en |
dc.subject | Bipolar transistors | en |
dc.subject | Chemical compounds | en |
dc.subject | Inorganic compounds | en |
dc.subject | Dielectrics | en |
dc.subject | Chemical bonds | en |
dc.title | Improvement in top-gate MoS2 transistor performance due to high quality backside Al2O3 layer | en |
dc.type | Article (peer-reviewed) | en |