Low resistivity Pt interconnects developed by electron beam assisted deposition using novel gas injector system

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dc.contributor.authorDias, R. J.
dc.contributor.authorO'Regan, Colm
dc.contributor.authorThrompenaars, P.
dc.contributor.authorRomano-Rodriguez, A.
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMulder, J. J. L.
dc.contributor.authorPetkov, Nikolay
dc.contributor.editorVol. 371
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2016-05-20T09:02:31Z
dc.date.available2016-05-20T09:02:31Z
dc.date.issued2012-07-02
dc.date.updated2013-03-07T21:46:06Z
dc.description.abstractElectron beam-induced deposition (EBID) is a direct write process where an electron beam locally decomposes a precursor gas leaving behind non-volatile deposits. It is a fast and relatively in-expensive method designed to develop conductive (metal) or isolating (oxide) nanostructures. Unfortunately the EBID process results in deposition of metal nanostructures with relatively high resistivity because the gas precursors employed are hydrocarbon based. We have developed deposition protocols using novel gas-injector system (GIS) with a carbon free Pt precursor. Interconnect type structures were deposited on preformed metal architectures. The obtained structures were analysed by cross-sectional TEM and their electrical properties were analysed ex-situ using four point probe electrical tests. The results suggest that both the structural and electrical characteristics differ significantly from those of Pt interconnects deposited by conventional hydrocarbon based precursors, and show great promise for the development of low resistivity electrical contacts.en
dc.description.sponsorshipScience Foundation Ireland (SFI 09/SIRG/I1621)en
dc.description.statusPeer revieweden
dc.description.urihttp://iopscience.iop.org/issue/1742-6596/371/1en
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationDias, R. J., Regan, C. O., Thrompenaars, P., Romano-Rodriguez, A., Holmes, J. D., Mulder, J. J. L. & Petkov, N. 2012. Low resistivity Pt interconnects developed by electron beam assisted deposition using novel gas injector system. Journal of Physics: Conference Series, 371, 012038. http://stacks.iop.org/1742-6596/371/i=1/a=012038en
dc.identifier.doi10.1088/1742-6596/371/1/012038
dc.identifier.endpage012038(4)en
dc.identifier.issn1742-6596
dc.identifier.issued1en
dc.identifier.journaltitleJournal of Physics: Conference Seriesen
dc.identifier.startpage012038(1)en
dc.identifier.urihttps://hdl.handle.net/10468/2591
dc.identifier.volume371en
dc.language.isoenen
dc.publisherIOP Publishingen
dc.rights© The authors, 2012. Published under licence in Journal of Physics: Conference Series by IOP Publishing Ltd. CC-BY Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the authors and the title of the work, journal citation and DOI.en
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/en
dc.subjectElectron beam-induced depositionen
dc.subjectEBIDen
dc.subjectLow resistivityen
dc.subjectNanostructuresen
dc.subjectFunctional materialsen
dc.subjectElectron microscopyen
dc.titleLow resistivity Pt interconnects developed by electron beam assisted deposition using novel gas injector systemen
dc.typeConference itemen
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