Improved high permeability CoZrTaB laminated thin films with novel CMOS compatible dielectric material

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dc.contributor.authorWei, Guannanen
dc.contributor.authorDas, Rajasreeen
dc.contributor.authorLordan, Danielen
dc.contributor.authorSai, Ranajiten
dc.contributor.authorHayes, Mikeen
dc.contributor.authorLorenc, Mareken
dc.contributor.authorClarke, Barryen
dc.contributor.authorHurley, Daviden
dc.contributor.authorMcCloskey, Paulen
dc.contributor.funderEnterprise Irelanden
dc.date.accessioned2024-03-21T12:14:40Z
dc.date.available2024-03-21T12:14:40Z
dc.date.issued2023-09-04en
dc.description.abstractThis paper present an optimized CoZrTaB-based laminated thin films with a novel wet etch-able oxide dielectric material. Wet etching capability was studied on the stack material exhibiting a narrow and clean undercut. Good uniaxial anisotropy with low coercivity was achieved via in-situ magnetic alignment during magnetron sputtering. Permeability of 432 and Q-factor of 23.4 at 100 MHz were observed in high frequency permeameter measurement. Finally thermal annealing was carried out at various temperatures. Uniaxial anisotropy was maintained up to 300 °C, while an enhancement of permeability (by 25%) was observed.en
dc.description.sponsorshipEnterprise Ireland (Innovation Partnership Programme Contract No: EI-IP20200912)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationWei, G., Das, R., Lordan, D., Sai, R., Hayes, M., Lorenc, M., Clarke, B., Hurley, D. and McCloskey, P. (2023) 'Improved high permeability CoZrTaB laminated thin films with novel CMOS compatible dielectric material', 2023 IEEE International Magnetic Conference - Short Papers (INTERMAG Short Papers), Sendai, Japan, 15-19 May, pp. 1-2. https://doi.org/10.1109/INTERMAGShortPapers58606.2023.10228354en
dc.identifier.doihttps://doi.org/10.1109/INTERMAGShortPapers58606.2023.10228354en
dc.identifier.endpage2en
dc.identifier.isbn979-8-3503-3836-2en
dc.identifier.isbn979-8-3503-3837-9en
dc.identifier.startpage1en
dc.identifier.urihttps://hdl.handle.net/10468/15688
dc.language.isoenen
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en
dc.relation.ispartof2023 IEEE International Magnetic Conference - Short Papers (INTERMAG Short Papers), Sendai, Japan, 15-19 Mayen
dc.rights© 2023, IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.en
dc.subjectCMOS compatibleen
dc.subjectHigh permeabilityen
dc.subjectHigh frequency soft magnetic materialen
dc.subjectInductoren
dc.titleImproved high permeability CoZrTaB laminated thin films with novel CMOS compatible dielectric materialen
dc.typeConference itemen
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