Theoretical investigation of carrier transport and recombination processes for deep UV (Al,Ga)N light emitters
dc.contributor.author | Finn, Robert | en |
dc.contributor.author | O’Donovan, Michael | en |
dc.contributor.author | Farrell, Patricio | en |
dc.contributor.author | Streckenbach, Timo | en |
dc.contributor.author | Moatti, Julien | en |
dc.contributor.author | Koprucki, Thomas | en |
dc.contributor.author | Schulz, Stefan | en |
dc.contributor.funder | Sustainable Energy Authority of Ireland | en |
dc.contributor.funder | Science Foundation Ireland | en |
dc.contributor.funder | Leibniz-Gemeinschaft | en |
dc.contributor.funder | Labex | en |
dc.date.accessioned | 2023-11-08T12:54:58Z | |
dc.date.available | 2023-11-08T12:54:58Z | |
dc.date.issued | 2023-10-09 | en |
dc.description.abstract | We present a theoretical study on the impact of alloy disorder on carrier transport and recombination rates in an (Al,Ga)N single quantum well based LED operating in the deep UV spectral range. Our calculations indicate that alloy fluctuations enable ‘percolative pathways’ which can result in improved carrier injection into the well, but may also increase carrier leakage from the well. Additionally, we find that alloy disorder induces carrier localization effects, a feature particularly noticeable for the holes. These localization effects can lead to locally increased carrier densities when compared to a virtual crystal approximation which neglects alloy disorder. We observe that both radiative and non-radiative recombination rates are increased. Our calculations also indicate that Auger-Meitner recombination increases faster than the radiative rate, based on a comparison with a virtual crystal approximation. | en |
dc.description.sponsorship | Science Foundation Ireland (12/RC/2276 P2; 21/FFP-A/9014); Leibniz-Gemeinschaft (Leibniz Competition 2020; Leibniz Competition 2022 UVSimTec K415/2021); Labex CEMPI (ANR11-LABX-0007-01) | en |
dc.description.status | Peer reviewed | en |
dc.description.version | Accepted Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Finn, R., O’Donovan, M., Farrell, P., Streckenbach, T., Moatti, J., Koprucki, T. and Schulz, S. (2023) 'Theoretical investigation of carrier transport and recombination processes for deep UV (Al,Ga)N light emitters', 2023 International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD), Turin, Italy, 18-21 September, pp. 83-84. doi: 10.1109/NUSOD59562.2023.10273485 | en |
dc.identifier.doi | 10.1109/nusod59562.2023.10273485 | en |
dc.identifier.eissn | 2158-3242 | en |
dc.identifier.endpage | 84 | en |
dc.identifier.isbn | 979-8-3503-1429-8 | en |
dc.identifier.isbn | 979-8-3503-1430-4 | en |
dc.identifier.issn | 2158-3234 | en |
dc.identifier.startpage | 83 | en |
dc.identifier.uri | https://hdl.handle.net/10468/15208 | |
dc.language.iso | en | en |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en |
dc.relation.ispartof | 2023 International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD) | en |
dc.relation.project | info:eu-repo/grantAgreement/SFI/SFI Career Development Award/17/CDA/4789(N)/IE/Nitride-based light emitters: From carrier localization and non-radiative recombination processes to quantum transport and device design/ | en |
dc.rights | © 2023, IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. | en |
dc.subject | Location awareness | en |
dc.subject | Solid modeling | en |
dc.subject | Three-dimensional displays | en |
dc.subject | Metals | en |
dc.subject | Charge carrier density | en |
dc.subject | Radiative recombination | en |
dc.subject | Crystals | en |
dc.title | Theoretical investigation of carrier transport and recombination processes for deep UV (Al,Ga)N light emitters | en |
dc.type | Conference item | en |