Access to this article is restricted until 12 months after publication by request of the publisher. Restriction lift date: 2025-06-16
III-V electro-absorption modulation and detection devices integrated to 220 nm silicon-on-insulator
dc.check.date | 2025-06-16 | en |
dc.check.info | Access to this article is restricted until 12 months after publication by request of the publisher | en |
dc.contributor.author | Moynihan, Owen | en |
dc.contributor.author | Ghosh, Samir | en |
dc.contributor.author | O’Callaghan, James | en |
dc.contributor.author | Roycroft, Brendan | en |
dc.contributor.author | Thomas, Kevin | en |
dc.contributor.author | Pelucchi, Emanuele | en |
dc.contributor.author | Corbett, Brian | en |
dc.contributor.funder | Science Foundation Ireland | en |
dc.date.accessioned | 2024-07-29T15:27:50Z | |
dc.date.available | 2024-07-29T15:27:50Z | |
dc.date.issued | 2024-06-16 | en |
dc.description.abstract | III-V indium phosphide (InP) ridge coupons capable of electro-absorption modulation and detection are integrated on a 220 nm silicon-on-insulator platform using transfer printing. The coupons employ a PIN structure design that can be actively biased to efficiently modulate and detect light with a bandwidth of >30 nm from 1550–1580 nm. Across the C-band, the grating coupled devices provide an extinction ratio (ER) of 25 dB and detect light with a responsivity of over 0.85 A/W, with an insertion loss (IL) at 0 V of 3.5 dB at 1580 nm and 6.5 dB at 1550 nm. | en |
dc.description.sponsorship | Science Foundation Ireland (12/RC/2276-P2) | en |
dc.description.status | Peer reviewed | en |
dc.description.version | Accepted Version | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Moynihan, O., Ghosh, S., O’Callaghan, J., Roycroft, B., Thomas, K., Pelucchi, E. and Corbett, B. (2024) 'III-V electro-absorption modulation and detection devices integrated to 220 nm silicon-on-insulator', in: Witzens, J., Poon, J., Zimmermann, L., Freude, W. (eds.) 25th European Conference on Integrated Optics (ECIO 2024), June 17–19, Aachen, Germany. Springer Proceedings in Physics, vol 402, pp. 53-57. Springer, Cham. https://doi.org/10.1007/978-3-031-63378-2_10 | en |
dc.identifier.doi | 10.1007/978-3-031-63378-2_10 | en |
dc.identifier.eissn | 1867-4941 | en |
dc.identifier.endpage | 57 | en |
dc.identifier.isbn | 9783031633775 | en |
dc.identifier.isbn | 9783031633782 | en |
dc.identifier.issn | 0930-8989 | en |
dc.identifier.journaltitle | Springer Proceedings in Physics | en |
dc.identifier.startpage | 53 | en |
dc.identifier.uri | https://hdl.handle.net/10468/16159 | |
dc.identifier.volume | 402 | en |
dc.language.iso | en | en |
dc.publisher | Springer Nature | en |
dc.relation.ispartof | 25th European Conference on Integrated Optics (ECIO 2024), June 17–19, Aachen, Germany. | en |
dc.relation.ispartof | Springer Proceedings in Physics | en |
dc.rights | © 2023 The Authors, under exclusive license to Springer Nature Switzerland AG. This is a pre-print of the following paper: Moynihan, O., Ghosh, S., O’Callaghan, J., Roycroft, B., Thomas, K., Pelucchi, E. and Corbett, B. (2024) 'III-V electro-absorption modulation and detection devices integrated to 220 nm silicon-on-insulator', in: Witzens, J., Poon, J., Zimmermann, L., Freude, W. (eds.) 25th European Conference on Integrated Optics (ECIO 2024), June 17–19, Aachen, Germany. Springer Proceedings in Physics, vol 402, pp. 53-57. Springer, Cham. Reproduced with permission of the publisher. The final authenticated version is available online at: https://doi.org/10.1007/978-3-031-63378-2_10 | en |
dc.subject | Heterogeneous integration | en |
dc.subject | Micro-transfer printing | en |
dc.subject | Electro-optic modulation | en |
dc.subject | Photo-detection | en |
dc.subject | Quantum-confined-Stark-effect (QCSE) | en |
dc.title | III-V electro-absorption modulation and detection devices integrated to 220 nm silicon-on-insulator | en |
dc.type | Book chapter | en |
dc.type | Conference item | en |
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